Asymmetric tunneling model of forward leakage current in GaN/InGaN light emitting diodes
Source abstract
Abstract
Through investigating the temperature dependent current-voltage (T-I-V) properties of GaN based blue and green LEDs in this study, we propose an asymmetric tunneling model to understand the leakage current below turn-on voltage (V < 3.2 V): At the forward bias within 1.5 V ∼ 2.1 V (region 1), the leakage current is main attributed to electrons tunneling from the conduction band of n-type GaN layer to the valence band of p-type GaN layer via defect states in space-charge region (SCR); While, at the forward bias within 2 V ∼ 2.4 V (region 2), heavy holes tunneling gradually becomes dominant at low temperature (T < 200K) as long as they can overcome the energy barrier height. The tunneling barrier for heavy holes is estimated to be lower than that for electrons, indicating the heavy holes might only tunnel to the defect states. This asymmetric tunneling model shows a novel carrier transport process, which provides better understanding of the leakage characteristics and is vital for future device improvements.
Source: crossref · Quality: baseline
Research context
OpenAlex topics: GaN-based semiconductor devices and materials · ZnO doping and properties · Ga2O3 and related materials
SciVX discovery tags are terminology-based. OpenAlex topics are source-provided classifications.
Affiliations
Nanjing National Laboratory of Microstructures Nanjing University Jiangsu Provincial Key Laboratory of Advanced photonic and Electronic Materials, School of Electronic Science and Engineering, , Nanjing 210093, People’s Republic of China
Funding
Major State Basic Research Project · Program Sponsored for Scientific Innovation Research of College Graduate in Jiangsu Province · Science Research Foundation of Graduate School of Nanjing University · National Natural Science Foundation of China · Natural Science Foundation of Jiangsu Province
References (13)
Show source-provided references
1. Nat. Photonics · 2009 · 3 · 18010.1038/nphoton.2009.32 ↗
2. Appl. Phys. Lett. · 2004 · 85 · 710.1063/1.1767280 ↗
3. Appl. Phys. Lett. · 2010 · 96 · 08350410.1063/1.3327332 ↗
4. Microelectron. Reliab. · 2003 · 43 · 198710.1016/j.microrel.2003.06.001 ↗
5. Appl. Phys. Lett. · 2002 · 81 · 475710.1063/1.1529306 ↗
6. IEEE Electron Device Lett. · 2002 · 23 · 53510.1109/LED.2002.802601 ↗
7. J. Appl. Phys · 2003 · 94 · 501410.1063/1.1605252 ↗
8. J. Appl. Phys · 2008 · 103 · 08610210.1063/1.2906326 ↗
9. Appl. Phys. Lett. · 2011 · 99 · 25111510.1063/1.3671395 ↗
10. Appl. Phys. Lett. · 1996 · 69 · 168010.1063/1.117026 ↗
11. 2006 · 516
12. Solid-State Electronics · 2003 · 47 · 11110.1016/S0038-1101(02)00256-3 ↗
13. Physica E: Low-dimensional Systems and Nanostructures · 2012 · 44 · 82110.1016/j.physe.2011.12.014 ↗