journal article·2015-04-01Open access

Donor-acceptor-pair emission in fluorescent 4H-SiC grown by PVT method

Xi Liu, Shi-Yi Zhuo, Pan Gao, Wei Huang, Cheng-Feng Yan, Er-Wei Shi

AIP Advances· Volume 5· Issue 4

Abstract

Fluorescent SiC, which contains donor and acceptor impurities with optimum concentrations, can work as a phosphor for visible light emission by donor-acceptor-pair (DAP) recombination. In this work, 3 inch N-B-Al co-doped fluorescent 4H-SiC crystals are prepared by PVT method. The p-type fluorescent 4H-SiC with low aluminum doping concentration can show intensive yellow-green fluorescence at room temperature. N-B DAP peak wavelength shifts from 578nm to 525nm and weak N-Al DAP emission occurred 403/420 nm quenches, when the temperature increases from 4K to 298K. The aluminum doping induces higher defect concentration in the fluorescent crystal and decreases optical transmissivity of the crystal in the visible light range. It triggers more non-radiative recombination and light absorption losses in the crystal.
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Research context

OpenAlex topics: Ga2O3 and related materials · Silicon Carbide Semiconductor Technologies · Semiconductor materials and devices

SciVX discovery tags are terminology-based. OpenAlex topics are source-provided classifications.

Affiliations

Chinese Academy of Sciences Shanghai Institute of Ceramics, , Shanghai, 200050, China

Funding

863 project · Guandong Natural Science Foundation

References (15)

Show source-provided references
1. J. Appl. Phys. · 2006 · 99 · 09310810.1063/1.2195883 ↗
2. J. Semicond. · 2011 · 32 · 01300410.1088/1674-4926/32/1/013004 ↗
3. Thin Solid Films · 2012 · 522 · 2310.1016/j.tsf.2012.02.017 ↗
4. J. Phys. D: Appl. Phys. · 2012 · 45 · 23510710.1088/0022-3727/45/23/235107 ↗
5. Opt. Mater.Express · 2011 · 1 · 143910.1364/OME.1.001439 ↗
6. Phys. Scr. · 2012 · T148 · 01400210.1088/0031-8949/2012/T148/014002 ↗
7. Phys. Rev. B · 1996 · 54 · 308410.1103/PhysRevB.54.3084 ↗
8. Nanotechnology · 2007 · 18 · 19530110.1088/0957-4484/18/19/195301 ↗
9. Mat. Sci. Eng. B · 1999 · 61-62 · 25810.1016/S0921-5107(98)00514-5 ↗
10. J. Electrochem. Sci. · 2013 · 8 · 709910.1016/S1452-3981(23)14832-2 ↗
11. Phys. Rev. B · 1980 · 22 · 610.1103/PhysRevB.22.2842 ↗
12. Thin Solid Films · 2012 · 522 · 3310.1016/j.tsf.2012.02.012 ↗
13. Appl. Phys. Lett · 2002 · 80 · 110.1063/1.1430262 ↗
14. J. Cryst. Growth · 2003 · 259 · 5210.1016/S0022-0248(03)01584-7 ↗
15. PHYSICAL REVIEW B · 2003 · 67 · 16521110.1103/PhysRevB.67.165211 ↗