journal article·2022-08-01Open access

The microscopic principle and traits on pulsed discharge of negative corona

Jian Sui, Ruijin Liao, Cong Wang, Zhengguang Liu, Panlong An

AIP Advances· Volume 12· Issue 8

Abstract

A systematic investigation of the dynamical behaviors and traits of negative corona discharge in pure oxygen is performed and the microscopic physical mechanism of the discharge is studied. In the meantime, a new dynamical model is presented, which can predict different discharge phases including steady-state discharge and periodic discharge of saw-tooth pulses. The change in the discharge outputs with time is analyzed comprehensively using the nonlinear dynamics method, and the Trichel pulsed oscillation and the dynamical characteristics are described. In addition, the positive ions impacting the cathode and the negative ions can be treated as feedback signals for maintaining pulsed discharge at the constant external excitation. It is found that the gas pressure levels significantly affect the discharge behaviors and the pulsed characteristics of charged particles and glow radiation. In particular, the microscopic mechanism of gas pressure level influencing the negative corona discharge is discovered. Meanwhile, the pulsed characteristics of the discharge outputs are studied, and an explanation of the microscopic formation mechanism of the symmetrical and asymmetrical jagged pulses of diverse outputs is given. It is revealed that the mass, migration speed, and migration time of various particles have a great influence on discharge behaviors.
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Research context

OpenAlex topics: Plasma Applications and Diagnostics · Plasma Diagnostics and Applications · High voltage insulation and dielectric phenomena

SciVX discovery tags are terminology-based. OpenAlex topics are source-provided classifications.

Affiliations

Chongqing University, State Key Laboratory of Power Transmission Equipment and System Security and New Technology 1 , Chongqing 400044, China

Oceanography College, Shanwei Polytechnic 2 , Shanwei 516600, China

Department of Public Basis, Zhaoqing Medical College 3 , Zhaoqing 526020, China

Shaanxi Railway Institute 4 , Weinan 714000, China

Funding

The National Basic Research Program of China · The Natural Science Foundation of Shanwei Polytechnic · The Natural Science Foundation of Shaanxi Province · The Key Basic Research Foundation of Weinan · The Natural Science Foundation Project of Shaanxi Railway Institute, China · The department of education of Guangdong Province · The Special Project in Key Fields of the Higher Education Institutions of Guangdong Province, China

References (28)

Show source-provided references
1. Contrib. Plasma Phys. · 1999 · 39 · 44110.1002/ctpp.2150390507 ↗
2. IEEE Trans. Plasma Sci. · 1995 · 23 · 66110.1109/27.467988 ↗
3. Plasma Processes Polym. · 2004 · 1 · 9110.1002/ppap.200400028 ↗
4. J. Phys. D: Appl. Phys. · 1987 · 20 · 142110.1088/0022-3727/20/11/010 ↗
5. IEEE Trans. Ind. Appl. · 1994 · 30 · 37010.1109/28.287521 ↗
6. IEEE Trans. Plasma Sci. · 1991 · 19 · 115210.1109/27.125038 ↗
7. J. Phys. D: Appl. Phys. · 2005 · 38 · R30310.1088/0022-3727/38/20/r01 ↗
8. Phys. Plasmas · 2012 · 19 · 06350210.1063/1.4725499 ↗
9. Phys. Rev. · 1938 · 54 · 107810.1103/physrev.54.1078 ↗
10. Phys. Rev. · 1941 · 60 · 71410.1103/physrev.60.714 ↗
11. Phys. Rev. · 1948 · 74 · 17010.1103/physrev.74.170 ↗
12. J. Appl. Phys. · 1974 · 45 · 10310.1063/1.1662943 ↗
13. J. Electrost. · 2017 · 88 · 4910.1016/j.elstat.2016.12.013 ↗
14. J. Phys. D: Appl. Phys. · 1982 · 15 · 196310.1088/0022-3727/15/10/015 ↗
15. J. Phys. D: Appl. Phys. · 1993 · 26 · 23110.1088/0022-3727/26/2/010 ↗
16. Phys. Rev. A · 1985 · 32 · 179910.1103/physreva.32.1799 ↗
17. J. Phys. D: Appl. Phys. · 2011 · 44 · 15550210.1088/0022-3727/44/15/155502 ↗
18. J. Chem. Phys. · 1980 · 73 · 313210.1063/1.440549 ↗
19. J. Phys. Chem. · 1989 · 93 · 74010.1021/j100339a047 ↗
20. 2014 · 210
22. 1986 · 26
23. 1999 · 31
24. J. Electrost. · 2017 · 87 · 11010.1016/j.elstat.2017.03.007 ↗
25. IEEE Access · 2021 · 9 · 15539310.1109/ACCESS.2021.3125855 ↗
26. Phys. Rev. A · 1991 · 43 · 110710.1109/access.2021.3125855 ↗
27. J. Phys. D: Appl. Phys. · 1993 · 26 · 60710.1088/0022-3727/26/4/013 ↗
28. Plasma Sources Sci. Technol. · 2020 · 29 · 01300110.1088/1361-6595/ab5051 ↗