Electron-beam lithography of nanostructures at the tips of scanning probe cantilevers
Source abstract
Abstract
We developed a process to fabricate nanoscale metallic gate electrodes on scanning probe cantilevers, including on the irregular surface of protruding cantilever tips. The process includes a floating-layer technique to coat the cantilevers in an electron-beam resist. We demonstrate gate definition through a lift-off process and through an etching process. The cantilevers maintain a high force sensitivity after undergoing the patterning process. Our method allows the patterning of nanoscale devices on fragile scanning probes, extending their functionality as sensors.
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Research context
OpenAlex topics: Force Microscopy Techniques and Applications · Surface and Thin Film Phenomena · Integrated Circuits and Semiconductor Failure Analysis
SciVX discovery tags are terminology-based. OpenAlex topics are source-provided classifications.
Affiliations
Department of Physics, University of Basel 1 , 4056 Basel, Switzerland
Swiss Nanoscience Institute, University of Basel 2 , 4056 Basel, Switzerland
IBM Research Europe–Zürich 3 , 8803 Rueschlikon, Switzerland
Funding
SNSF NCCR SPIN · Canton Aargau · Horizon 2020 Framework Program
References (18)
Show source-provided references
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