journal article·2015-06-01Open access

Relationship between transport properties and band diagrams in InAsxSb1−x/Al0.1In0.9Sb quantum wells

Takashi Manago, Shuichi Ishida, Hirotaka Geka, Ichiro Shibasaki

AIP Advances· Volume 5· Issue 6

Abstract

The resistivity of InAs0.1Sb0.9/Al0.1In0.9Sb quantum wells (QWs) is much lower than that of InSb/Al0.1In0.9Sb QWs, staying low resistivity even at low temperature. Fundamental difference in low temperature transport properties between InSb/Al0.1In0.9Sb and InAs0.1Sb0.9/Al0.1In0.9Sb QWs was revealed, based on the band diagram calculations of these QWs. Band diagrams of InAsxSb1−x/Al0.1In0.9Sb QWs showed that the energy band of the InAsxSb1−x layer moves downward with increasing As content x. The QW is type I at x equal to 0, becomes type II at x equal to 0.1. The Fermi level (EF) of the InSb QWs lies in the band gap and below apart from the bottom of the conduction band, while EF of the InAs0.1Sb0.9 QWs is above the bottom of the conduction band of the well. The calculated sheet carrier densities are in good agreement with the experimental results. It well explains that the sheet carrier density difference between InSb and InAs0.1Sb0.9 QWs mainly originates from this band diagram difference and the position of EF.
Source: crossref · Quality: baseline

Research context

OpenAlex topics: Semiconductor Quantum Structures and Devices · Quantum and electron transport phenomena · Advancements in Semiconductor Devices and Circuit Design

SciVX discovery tags are terminology-based. OpenAlex topics are source-provided classifications.

Affiliations

Fukuoka University 1 Department of Applied Physics, , Jonan, Fukuoka 814-0180, Japan

Tokyo University of Science 2 Department of Electrical Engineering, , Yamaguchi, Sanyo-Onoda, Yamaguchi 756-0884, Japan

Asahi Kasei Corporation 3 , Fuji, Shizuoka 416-8501, Japan

The Noguchi Institute 4 , Itabashi, Tokyo 173-0003, Japan

Funding

Japan Society for the Promotion of Science

References (31)

Show source-provided references
1. Appl. Phys. Lett · 2006 · 88 · 19190810.1063/1.2203223 ↗
2. Appl. Phys. Lett · 2007 · 91 · 06210610.1063/1.2768033 ↗
3. Phys. Rev. B · 2010 · 81 · 07530310.1103/PhysRevB.81.075303 ↗
4. IEEE Trans. Magn. · 2002 · 38 · 243810.1109/TMAG.2002.803607 ↗
5. 2005 · 763
6. Appl. Phys. Lett. · 2002 · 80 · 401210.1063/1.1481238 ↗
7. 2009 · 182
8. Jpn. J. Appl. Phys. · 1999 · 38 · 68510.1143/JJAP.38.685 ↗
9. Jpn. J. Appl. Phys. · 2011 · 50 · 06020610.7567/JJAP.50.060206 ↗
10. J. Crystal Growth · 1999 · 201/202 · 76510.1016/S0022-0248(98)01466-3 ↗
11. 1999 · 514
12. J. Crystal Growth · 2001 · 227/228 · 61910.1016/S0022-0248(01)00784-9 ↗
13. 2001 · 137
14. J. Crystal Growth · 2003 · 251 · 56010.1016/S0022-0248(02)02448-X ↗
15. J. Crystal Growth · 2005 · 278 · 60410.1016/j.jcrysgro.2004.12.077 ↗
16. J. Crystal Growth · 2007 · 301-302 · 15210.1016/j.jcrysgro.2006.11.257 ↗
17. 2007 · 89
18. 2007 · 203
19. J. Crystal Growth · 2009 · 311 · 171110.1016/j.jcrysgro.2008.11.082 ↗
20. J. Crystal Growth · 2009 · 311 · 212810.1016/j.jcrysgro.2008.10.057 ↗
21. Physica E · 2010 · 42 · 97510.1016/j.physe.2009.11.116 ↗
22. Physica E · 2010 · 42 · 98410.1016/j.physe.2009.11.135 ↗
23. Physics Procedia · 2010 · 3 · 121910.1016/j.phpro.2010.01.166 ↗
24. Physic Procedia · 2010 · 3 · 121310.1016/j.phpro.2010.01.165 ↗
25. J. Appl. Phys. · 2015 · 117 · 06570110.1063/1.4907806 ↗
26. Jpn. J. Appl. Phys. · 1999 · 38 · 110710.1143/JJAP.38.1107 ↗
27. J. Appl. Phys. · 1993 · 74 · 179310.1063/1.354783 ↗
28. Jpn. J. Appl. Phys. · 1998 · 37 · L113210.1143/JJAP.37.L1132 ↗
29. J. Vac. Sci. Technol. B · 1988 · 6 · 124510.1116/1.584244 ↗
30. Phys. Rev. Lett. · 1984 · 52 · 46510.1103/PhysRevLett.52.465 ↗
31. Microelectronics Journal · 2009 · 40 · 54210.1016/j.mejo.2008.06.093 ↗