journal article·2023-02-01Open access

Improvement of physical properties of MOS devices based on rare earth oxides

A. Cherif, S. Alotaibi, H. Saghrouni, L. Beji

AIP Advances· Volume 13· Issue 2

Abstract

We have successfully deposited a thin film of rare earth oxide on a Si substrate. After morphological characterization via a scanning electron microscope and an atomic force microscope, the electrical properties of the Al/Dy2O3/Si MOS structure were investigated using the current–voltage I(V) and capacitance–voltage C(V) measurements, as well as a study in the dynamic regime (AC) via conductance–frequency σ(f) measurements at different temperatures. Based on the classical Schottky model, we were able to determine some physical parameters, namely, the ideality factor and the potential barrier height. The effect of resistance and interface states on the current–voltage characteristics is observable and results in a deviation from the ideality factor. Then, dielectric data have been acquired by means of impedance spectroscopy over a wide frequency and temperature range. These results show that understanding the temperature dependence of the electrical characteristics of this structure may be of great help in improving the quality of Dy2O3 developed on a Si substrate for the future of device technology.
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Research context

OpenAlex topics: Semiconductor materials and devices · Semiconductor materials and interfaces · Integrated Circuits and Semiconductor Failure Analysis

SciVX discovery tags are terminology-based. OpenAlex topics are source-provided classifications.

Affiliations

Department of Physics, College of Science, Jouf University 1 , P.O. Box 2014, Sakaka, Saudi Arabia

Laboratory of Energy and Materials (LR11ES34), Higher School of Science and Technology of Hammam, University of Sousse 2 , Street Lamine Abessi, 4011 Hammam Sousse, Tunisia

Department of Physics, College of Science and Arts, Ar-Rass, Qassim University 3 , Buraydah 51921, Saudi Arabia

Funding

Al Jouf University

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