The potential application of ultra-nanocrystalline diamond films for heavy ion irradiation detection
Source abstract
Abstract
The potential of utilizing the ultra-nanocrystalline (UNCD) films for detecting the Au-ion irradiation was investigated. When the fluence for Au-ion irradiation is lower than the critical value (fc = 5.0 × 1012 ions/cm2) the turn-on field for electron field emission (EFE) process of the UNCD films decreased systematically with the increase in fluence that is correlated with the increase in sp2-bonded phase (π*-band in EELS) due to the Au-ion irradiation. The EFE properties changed irregularly, when the fluence for Au-ion irradiation exceeds this critical value. The transmission electron microscopic microstructural examinations, in conjunction with EELS spectroscopic studies, reveal that the structural change preferentially occurred in the diamond-to-Si interface for the samples experienced over critical fluence of Au-ion irradiation, viz. the crystalline SiC phase was induced in the interfacial region and the thickness of the interface decreased. These observations implied that the UNCD films could be used as irradiation detectors when the fluence for Au-ion irradiation does not exceed such a critical value.
Source: crossref · Quality: baseline
Research context
OpenAlex topics: Diamond and Carbon-based Materials Research · Ion-surface interactions and analysis · Metal and Thin Film Mechanics
SciVX discovery tags are terminology-based. OpenAlex topics are source-provided classifications.
Affiliations
Tamkang University 1 Department of Physics, , Tamsui, New-Taipei, Taiwan 251, ROC
National Tsing Hua University 3 Department of Materials Science and Engineering, , Hsinchu, Taiwan , 300, ROC
Taipei College of Maritime Technology 2 Department of Information Technology and Mobile Communication, , Tamsui, New-Taipei, Taiwan 251, ROC
Lawrence Berkeley National Laboratory 4 Advanced Light Source, , Berkeley, CA 94720, USA
References (44)
Show source-provided references
1. IEEE TNS · 1977 · 24 · 235
2. Microsystem Technol. · 1999 · 6 · 2310.1007/s005420050170 ↗
3. Diam. Relat. Mater. · 2001 · 10 · 63110.1016/S0925-9635(00)00554-9 ↗
4. Semicond. Sci. Technol. · 2003 · 18 · S10510.1088/0268-1242/18/3/315 ↗
5. J. Appl. Phys. · 2007 · 102 · 11351610.1063/1.2818372 ↗
6. Thin Solid Films · 2007 · 515 · 353910.1016/j.tsf.2006.10.132 ↗
7. Science · 2004 · 306 · 153710.1126/science.1102910 ↗
8. Chem. Phys. Lett. · 2007 · 446 · 10310.1016/j.cplett.2007.08.018 ↗
9. J. Appl. Phys. · 2000 · 88 · 296710.1063/1.1287602 ↗
10. J. Appl. Phys. · 2013 · 113 · 11370410.1063/1.4795507 ↗
11. 1969
12. Annu. Rev. Mater. Sci. · 1999 · 29 · 21110.1146/annurev.matsci.29.1.211 ↗
13. Appl. Phys. Lett. · 2002 · 81 · 223510.1063/1.1503153 ↗
14. Physica B · 1993 · 185 · 21710.1016/0921-4526(93)90240-7 ↗
15. Phys. Rev. B · 1995 · 51 · 1571110.1103/PhysRevB.51.15711 ↗
16. J. Appl. Phys. · 2003 · 94 · 195910.1063/1.1587263 ↗
17. Diam. Relat. Mater. · 2003 · 12 · 46910.1016/S0925-9635(02)00352-7 ↗
18. Appl. Phys. Lett. · 1990 · 57 · 218710.1063/1.103931 ↗
19. Appl. Phys. Lett. · 1995 · 67 · 115710.1063/1.114993 ↗
20. Thin Solid Films · 1997 · 305 · 8810.1016/S0040-6090(97)00167-3 ↗
21. Phys. Rev. B · 2007 · 76 · 15540310.1103/PhysRevB.76.155403 ↗
22. Vacuum · 2004 · 72 · 29710.1016/j.vacuum.2003.08.007 ↗
23. Nucl. Instr. and Meth. B. · 2006 · 244 · 21710.1016/j.nimb.2005.11.020 ↗
24. 1985
25. Proc. Roy. Soc. A · 1928 · 119 · 17310.1098/rspa.1928.0091 ↗
26. Diamond & Related Materials · 2005 · 14 · 8610.1016/j.diamond.2004.07.012 ↗
27. J. Appl. Phys. · 1987 · 61 · 449210.1063/1.338410 ↗
28. Phys. Rev. B · 1986 · 33 · 134610.1103/PhysRevB.33.1346 ↗
29. 1992
30. Phys. Rev. Lett. · 1985 · 54 · 196010.1103/PhysRevLett.54.1960 ↗
31. Appl. Phys. Lett. · 1996 · 69 · 56810.1063/1.117789 ↗
32. Chem. Phys. Lett. · 2003 · 372 · 32010.1016/S0009-2614(03)00374-9 ↗
33. Thin Solid Films · 1998 · 319 · 9710.1016/S0040-6090(97)01094-8 ↗
34. Diam. Relat. Mater. · 2000 · 9 · 102610.1016/S0925-9635(00)00224-7 ↗
35. Surf. Sci. · 2001 · 482–485 · 53010.1016/S0039-6028(01)00939-6 ↗
36. Phys. Rev. B · 1998 · 57 · 1412310.1103/PhysRevB.57.14123 ↗
37. Phys. Rev. B · 2005 · 72 · 01412010.1103/PhysRevB.72.014120 ↗
38. Phys. Rev. B · 2007 · 75 · 19543110.1103/PhysRevB.75.195431 ↗
39. Appl. Phys. Lett. · 1994 · 64 · 150210.1063/1.111872 ↗
40. J. Appl. Phys. · 2010 · 107 · 03430410.1063/1.3296187 ↗
41. Appl. Phys. Lett. · 2012 · 101 · 04190710.1063/1.4738885 ↗
42. Phys. Rev. B · 1993 · 48 · 1212310.1103/PhysRevB.48.12123 ↗
43. Phys. Rev. B · 2000 · 62 · R1636010.1103/PhysRevB.62.R16360 ↗
44. Chemical Physics Letters · 2000 · 332 · 9310.1016/S0009-2614(00)01236-7 ↗