Reflectance of a reflective photonic crystal p-contact layer for improving the light-extraction efficiency of AlGaN-based deep-ultraviolet light-emitting diodes
Source abstract
Abstract
We utilized the finite-difference time-domain method (FDTD) to investigate the reflectance of an air void photonic crystal (PhC) on the p-electrode of an AlGaN-based deep ultraviolet (DUV) light-emitting diode (LED). Firstly, a transparent p-AlGaN layer with cylindrical air voids on a Ni(1nm)/Al(140nm) metal electrode was optimized to maximize the reflectance at normal incidence. It was shown that by having the optimum AlGaN PhC on the metal electrode, the reflectance as a function of the angle of incidence was advantageously redistributed to increase LEE. The calculated angle-dependent reflectances were converted to average reflectance considering the power distribution of dipole sources in the TE and TM modes. The average reflectances of a reference structure and the PhC structure for the TM mode at wavelengths around 283 nm were 77.1 and 85.2%, respectively. Thus, an incremental increase of 8% in average reflectance for the TM mode was obtained by adopting the optimized PhC. Secondly, we investigated a PhC with air voids in two different layers, a p-GaN layer and a p-AlGaN layer on the Ni/Al. The calculated average reflectances at 283 nm were 38% and 42% for the TE and TM modes, respectively, when the thickness of the p-GaN layer was 70 nm. The average reflectances for the TE and TM modes with a uniform 70nm thick p-GaN layer without a PhC were 4.2 and 3.6%, respectively. This clearly shows that the optimized PhC can reduce light absorption in both the p-GaN layer and the metal electrode.
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Research context
OpenAlex topics: GaN-based semiconductor devices and materials · Photonic Crystals and Applications · Optical Coatings and Gratings
SciVX discovery tags are terminology-based. OpenAlex topics are source-provided classifications.
Affiliations
RIKEN 1 , Wako, Saitama 351-0198, Japan
Marubun Corporation 2 , Chuo, Tokyo 109-8577, Japan
References (18)
Show source-provided references
1. Jpn. J. Appl. Phys., Part 1 · 2014 · 53 · 10020910.7567/jjap.53.100209 ↗
2. Appl. Phys. Lett. · 2006 · 89 · 26111410.1063/1.2424668 ↗
3. IEEE J. Sel. Top. Quantum Electron. · 2002 · 8 · 74410.1109/jstqe.2002.801677 ↗
4. J. Appl. Phys. · 2005 · 97 · 09110110.1063/1.1899760 ↗
5. Appl. Phys. Express · 2013 · 6 · 06210110.7567/apex.6.062101 ↗
6. J. Appl. Phys. · 2017 · 121 · 01310510.1063/1.4973493 ↗
7. Phys. Status Solidi A · 2018 · 1700435
8. Jpn. J. Appl. Phys. · 2018 · 57 · 04FH0810.7567/jjap.57.04fh08 ↗
9. Appl. Phys. Express · 2018 · 11 · 01210110.7567/apex.11.012101 ↗
10. Nat. Commun. · 2015 · 6 · 1010210.1038/ncomms10102 ↗
11. Phys. Rev. B · 2013 · 88 · 16511610.1103/physrevb.88.165116 ↗
12. Phys. Rev. B · 2002 · 65 · 23511210.1103/physrevb.65.235112 ↗
13. Phys. Rev. B · 1999 · 60 · 8
14. J. Opt. Soc. Am. B · 2012 · 29 · 10910.1364/josab.29.000109 ↗
15. 2012 · 510.1007/978-3-031-01713-1_2 ↗
16. Appl. Opt. · 1998 · 37 · 527110.1364/ao.37.005271 ↗
17. IEEE Photon. Technol. Lett. · 2009 · 21 · 81710.1109/lpt.2009.2018638 ↗
18. Microwave Opt. Technol. Lett. · 1995 · 8 · 25710.1002/mop.4650080512 ↗