Large area deep ultraviolet light of Al0.47Ga0.53N/Al0.56Ga0.44N multi quantum well with carbon nanotube electron beam pumping

Large area deep ultraviolet (DUV) light is generated by carbon nanotube (CNT) cold cathode electron beam (C-beam) irradiation on Al0.47Ga0.53N/Al0.56Ga0.44N multi quantum wells (MQWs) anode. We developed areal electron beam (EB) with CNT cold cathode emitters. The CNT emitters on silicon wafer were deposited with an area of 188 mm2, and these were vertically aligned and had conical structures. We optimized the C-beam irradiation conditions to effectively excite AlGaN MQWs. When AlGaN MQWs were excited using an anode voltage of 3 kV and an anode current of 0.8 mA, DUV with a wavelength of 278.7 nm was generated in a large area of 303 mm2. This DUV area is more than 11 times larger than the light emitting area of conventional EB pumped light sources and UV-LEDs.