Polarized Raman spectra of β-FeSi2 epitaxial film grown by molecular beam epitaxy
Source abstract
Abstract
Polarized Raman spectra of a β-FeSi2(100)//Si(001) epitaxial film grown by molecular beam epitaxy were measured to identify the Raman mode of the observed Raman active lines. Twelve of the observed 18 Raman lines showed a clear dependence of the Raman intensity on the crystal rotation angle. By factor group analysis using the orthorhombic symmetry D2h18 of β-FeSi2, five Raman lines (193, 200, 249, 401, 494 cm-1) and seven lines (175, 277, 284, 298, 327, 410, 442 cm-1) were completely assigned to the Ag and B3g modes, respectively. The depolarization ratio of Raman scattering intensities was obtained from polarized Raman spectra measured in two polarization configurations. The values of the depolarization ratio also support the assignment of the Ag and B3g modes in β-FeSi2.
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Research context
OpenAlex topics: Semiconductor materials and interfaces · Surface and Thin Film Phenomena · Semiconductor materials and devices
SciVX discovery tags are terminology-based. OpenAlex topics are source-provided classifications.
Affiliations
Department of Computer Science and Electronics, Kyushu Institute of Technology 1 , Iizuka, Fukuoka 820-8502, Japan
Graduate School of Science and Engineering, Kagoshima University 2 , Kagoshima 890-0065, Japan
Funding
Japan Society for the Promotion of Science
References (36)
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