journal article·2018-10-01Open access

Polarized Raman spectra of β-FeSi2 epitaxial film grown by molecular beam epitaxy

Yoshikazu Terai, Haruki Yamaguchi, Hiroaki Tsukamoto, Naoki Murakoso, Hirofumi Hoshida

AIP Advances· Volume 8· Issue 10

Abstract

Polarized Raman spectra of a β-FeSi2(100)//Si(001) epitaxial film grown by molecular beam epitaxy were measured to identify the Raman mode of the observed Raman active lines. Twelve of the observed 18 Raman lines showed a clear dependence of the Raman intensity on the crystal rotation angle. By factor group analysis using the orthorhombic symmetry D2h18 of β-FeSi2, five Raman lines (193, 200, 249, 401, 494 cm-1) and seven lines (175, 277, 284, 298, 327, 410, 442 cm-1) were completely assigned to the Ag and B3g modes, respectively. The depolarization ratio of Raman scattering intensities was obtained from polarized Raman spectra measured in two polarization configurations. The values of the depolarization ratio also support the assignment of the Ag and B3g modes in β-FeSi2.
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Research context

OpenAlex topics: Semiconductor materials and interfaces · Surface and Thin Film Phenomena · Semiconductor materials and devices

SciVX discovery tags are terminology-based. OpenAlex topics are source-provided classifications.

Affiliations

Department of Computer Science and Electronics, Kyushu Institute of Technology 1 , Iizuka, Fukuoka 820-8502, Japan

Graduate School of Science and Engineering, Kagoshima University 2 , Kagoshima 890-0065, Japan

Funding

Japan Society for the Promotion of Science

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