journal article·2017-12-01Open access

Damping constant measurement and inverse giant magnetoresistance in spintronic devices with Fe4N

Xuan Li, Hongshi Li, Mahdi Jamali, Jian-Ping Wang

AIP Advances· Volume 7· Issue 12

Abstract

Fe4N is one of the attractive materials for spintronic devices due to its large spin asymmetric conductance and negative spin polarization at the Fermi level. We have successfully deposited Fe4N thin film with (001) out-of-plane orientation using a DC facing-target-sputtering system. A Fe(001)/Ag(001) composite buffer layer is selected to improve the (001) orientation of the Fe4N thin film. The N2 partial pressure during sputtering is optimized to promote the formation of Fe4N phase. Moreover, we have measured the ferromagnetic resonance (FMR) of the (001) oriented Fe4N thin film using coplanar waveguides and microwave excitation. The resonant fields are tested under different microwave excitation frequencies, and the experimental results match well with the Kittel formula. The Gilbert damping constant of Fe4N is determined to be α = 0.021±0.02. We have also fabricated and characterized the current-perpendicular-to-plane (CPP) giant magnetoresistance (GMR) device with Fe4N/Ag/Fe sandwich. Inverse giant magnetoresistance is observed in the CPP GMR device, which suggests that the spin polarization of Fe4N and Fe4N/Ag interface is negative.
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Research context

OpenAlex topics: Magnetic properties of thin films · Copper Interconnects and Reliability · Semiconductor materials and devices

SciVX discovery tags are terminology-based. OpenAlex topics are source-provided classifications.

Affiliations

Department of Electrical and Computer Engineering, University of Minnesota 1 , Minneapolis, Minnesota 55455, United States

Department of Chemical Engineering and Materials Science, University of Minnesota 2 , Minneapolis, Minnesota 55455, United States

Funding

National Science Foundation · DOD | Defense Advanced Research Projects Agency · SRC | Microelectronics Advanced Research Corporation

References (19)

Show source-provided references
1. Appl. Phys. Express · 2010 · 3 · 10300210.1143/apex.3.103002 ↗
2. Acta Mater. · 2013 · 61 · 638710.1016/j.actamat.2013.07.016 ↗
3. J. Appl. Phys. · 2011 · 109 · 07E12610.1063/1.3556919 ↗
4. Phys. Rev. B · 2006 · 73 · 17241010.1103/physrevb.73.172410 ↗
5. Appl. Phys. Lett. · 2009 · 94 · 20250210.1063/1.3140459 ↗
6. J. Appl. Phys. · 2007 · 102 · 01391710.1063/1.2753576 ↗
7. J. Appl. Phys. · 2009 · 105 · 07C92810.1063/1.3072827 ↗
8. Japanese J. Appl. Phys. · 2012 · 51 · 06800110.7567/jjap.51.068001 ↗
9. Appl. Phys. Express · 2009 · 2 · 08300110.1143/apex.2.083001 ↗
10. Appl. Phys. Express · 2010 · 3 · 11300310.1143/apex.3.113003 ↗
11. J. Appl. Phys. · 2012 · 112 · 01391110.1063/1.4733327 ↗
12. IEEJ Trans. Electr. Electron. Eng. · 2014 · 9 · S7310.1002/tee.22040 ↗
13. J. Magn. Magn. Mater. · 1996 · 159 · L110.1016/0304-8853(96)00062-5 ↗
14. Appl. Phys. Express · 2013 · 6 · 06300410.7567/apex.6.063004 ↗
15. Jpn. J. Appl. Phys. · 2013 · 52 · 07300110.7567/jjap.52.073001 ↗
16. Phys. Rev. B · 2014 · 90 · 01442010.1103/physrevb.90.014420 ↗
17. Appl. Phys. Lett. · 2013 · 103 · 25240910.1063/1.4853195 ↗
18. IEEE Trans. Magn. · 2006 · 42 · 237210.1109/tmag.2006.878813 ↗
19. Eur. Phys. J. B · 2007 · 59 · 47510.1140/epjb/e2007-00071-1 ↗