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1. 2005
2. 2014
3. 2011
8. Control of ion energy distributions using phase shifting in multi-frequency capacitively coupled plasmas
10.1063/1.4922631 ↗9. Controlling the shape of the ion energy distribution at constant ion flux and constant mean ion energy with tailored voltage waveforms
10.1088/0963-0252/25/2/025006 ↗10. Voltage waveform tailoring in radio frequency plasmas for surface charge neutralization inside etch trenches
10.1088/1361-6595/ab2c72 ↗12. Structured ion energy distribution in radio frequency glow discharge systems
10.1063/1.100913 ↗13. Ion and electron dynamics in the sheath of radio frequency glow discharges
10.1063/1.348601 ↗15. Plasma etching of high aspect ratio features in SiO2 using Ar/C4F8/O2 mixtures: A computational investigation
10.1116/1.5090606 ↗16. Pattern dependent profile distortion during plasma etching of high aspect ratio features in SiO2
10.1116/1.5132800 ↗17. Current status and nature of high-frequency electronegative plasmas: basis for material processing in device manufacturing
10.7567/1347-4065/ab4d23 ↗18. Functional separation of biasing and sustaining voltages in two-frequency capacitively coupled plasma
10.1063/1.127020 ↗21. The role of the relative voltage and phase for frequency coupling in a dual-frequency capacitively coupled plasma
10.1063/1.2972117 ↗23. Numerical investigation of ion-energy-distribution functions in single and dual frequency capacitively coupled plasma reactors
10.1103/PhysRevE.69.026406 ↗24. Modeling of single and dual frequency capacitive discharge in argon hydrogen mixture- dynamic effects and ion energy distribution functions
10.1002/ppap.201600119 ↗25. Frequency coupling in dual frequency capacitively coupled radio-frequency plasmas
10.1063/1.2425044 ↗27. The electrical asymmetry effect—A novel and simple method for separate control of ion energy and flux in capacitively coupled RF discharges
10.1088/1742-6596/162/1/012010 ↗29. The electrical asymmetry effect in capacitively coupled radio frequency discharges – measurements of dc self bias, ion energy and ion flux
10.1088/0022-3727/42/9/092005 ↗30. Making a geometrically asymmetric capacitive rf discharge electrically symmetric
10.1063/1.3544541 ↗32. Radio-frequency capacitively coupled plasmas excited by tailored voltage waveforms: Comparison of experiment and particle-in-cell simulations
10.1088/0022-3727/46/23/235201 ↗35. Strong ionization asymmetry in a geometrically symmetric radio frequency capacitively coupled plasma induced by sawtooth voltage waveforms
10.1103/physrevlett.114.125002 ↗37. Growth mechanisms study of microcrystalline silicon deposited by SiH4/H2 plasma using tailored voltage waveforms
10.1063/1.4866693 ↗38. Ion energy control via the electrical asymmetry effect to tune coating properties in reactive radio frequency sputtering
10.1088/1361-6595/ab504b ↗40. Ion energy and angular distributions in low-pressure capacitive oxygen RF discharges driven by tailored voltage waveforms
10.1088/1361-6595/aae5c3 ↗41. The influence of electron reflection/sticking coefficients at the electrodes on plasma parameters in particle-in-cell simulations of capacitive radio-frequency plasmas
10.1088/0963-0252/25/1/015024 ↗43. The influence of the secondary electron induced asymmetry on the electrical asymmetry effect in capacitively coupled plasmas
10.1063/1.4817920 ↗44. Charged particle dynamics and distribution functions in low pressure dual-frequency capacitively coupled plasmas operated at low frequencies and high voltages
10.1088/1361-6595/ab9374 ↗45. Magnetical asymmetric effect in geometrically and electrically symmetric capacitively coupled plasma
10.1002/ppap.201700087 ↗46. Magnetical asymmetry effect in capacitively coupled plasmas: Effects of the magnetic field gradient, pressure, and gap length
10.1088/1361-6595/aab47e ↗47. Experimental investigations of the magnetic asymmetry effect in capacitively coupled radio frequency plasmas
10.1088/1361-6595/aae199 ↗48. Spatial symmetry breaking in single-frequency CCP discharge with transverse magnetic field
10.1063/1.5033350 ↗50. Control of charged particle dynamics in capacitively coupled plasmas driven by tailored voltage waveforms in mixtures of Ar and CF4
10.1088/1361-6595/ab3c7c ↗51. Numerical simulations of electrical asymmetry effect on electronegative plasmas in capacitively coupled rf discharge
10.1063/1.3530626 ↗54. Controlling plasma properties under differing degrees of electronegativity using odd harmonic dual frequency excitation
10.1088/1361-6595/aa8dcd ↗55. 2004
59. Electron dynamics in low pressure capacitively coupled radio frequency discharges
10.1063/5.0003114 ↗61. 2012
63. 2D particle-in-cell simulations of geometrically asymmetric low-pressure capacitive RF plasmas driven by tailored voltage waveforms
10.1088/1361-6595/abf31d ↗64. Surface processes in low-pressure capacitive radio frequency discharges driven by tailored voltage waveforms
10.1088/1361-6595/ab9156 ↗71. The application of scattering cross sections to ion flux models in discharge sheaths
10.1063/1.357820 ↗73. Two-dimensional self-consistent radio frequency plasma simulations relevant to the gaseous electronics conference RF reference cell
10.6028/jres.100.036 ↗74. Beyond the step model: Approximate expressions for the field in the plasma boundary sheath
10.1063/1.2772499 ↗75. Frequency dependence of the electrical asymmetry effect in dual-frequency capacitively coupled discharges
10.1063/1.4802241 ↗77. Experimental investigations of electron heating dynamics and ion energy distributions in capacitive discharges driven by customized voltage waveforms
10.1063/1.4937403 ↗78. Apparent secondary-electron emission coefficient and the voltage-current characteristics of argon glow discharges
10.1103/PhysRevE.64.026401 ↗79. A computationally assisted spectroscopic technique to measure secondary electron emission coefficients in radio frequency plasmas
10.1088/0022-3727/49/23/234001 ↗