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journal article·2015-09-01Open access

Discharge current modes of high power impulse magnetron sputtering

Zhongzhen Wu, Shu Xiao, Zhengyong Ma, Suihan Cui, Shunping Ji, Xiubo Tian, Ricky K. Y. Fu, Paul K. Chu, Feng Pan

AIP Advances· Volume 5· Issue 9
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Source abstract

Abstract

Based on the production and disappearance of ions and electrons in the high power impulse magnetron sputtering plasma near the target, the expression of the discharge current is derived. Depending on the slope, six possible modes are deduced for the discharge current and the feasibility of each mode is discussed. The discharge parameters and target properties are simplified into the discharge voltage, sputtering yield, and ionization energy which mainly affect the discharge plasma. The relationship between these factors and the discharge current modes is also investigated.
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Research context

OpenAlex topics: Metal and Thin Film Mechanics · Ion-surface interactions and analysis · Diamond and Carbon-based Materials Research

SciVX discovery tags are terminology-based. OpenAlex topics are source-provided classifications.

Affiliations

Peking University 1 School of Advanced Materials, Shenzhen Graduate School, , Shenzhen 518055, China

Harbin Institute of Technology 2 State Key Laboratory of Advanced Welding and Joining, , Harbin 150001, China

3Department of Physics and Materials Science, City University of Hong Kong, Tat Chee Avenue, Kowloon, Hong Kong, China

Funding

City University of Hongkong Strategic Research Grant · Shenzhen Science and Technology Research Grant Guangdong-Hongkong Technology Cooperation Funding · National Natural Science Foundation of China

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