Growth and characterization of detector-grade CdMnTe by the vertical Bridgman technique
Source abstract
Abstract
We grew Cd1-xMnxTe crystals with a nominal Mn concentration of 5% by the vertical Bridgman growth technique. The compositional variation along the length of the grown ingot was studied by powder X-ray diffraction. The composition was found to be uniform along the growth direction. The achieved resistivity was 1-2.5 x1010 ohm-cm with a mobility-lifetime (μτ) product value for electrons of ∼1.7x10-3 cm2/V. An energy resolution of ∼7.5% at 662 keV was achieved for a 9-mm long Frisch grid detector fabricated from an ingot grown using as-received starting materials.
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Research context
OpenAlex topics: Advanced Semiconductor Detectors and Materials · Semiconductor Quantum Structures and Devices · Chalcogenide Semiconductor Thin Films
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Affiliations
Brookhaven National Laboratory 1 , Upton, New York 11973, USA
Alabama A&M University 2 , Normal, Alabama 35762, USA
Funding
U.S. Department of Homeland Security · Office of Defense Nuclear Nonproliferation
References (27)
Show source-provided references
1. Cryst. Res. Technol. · 2010 · 45 · 710.1002/crat.200900623 ↗
2. J. Appl. Phys. · 1988 · 64 · R2910.1063/1.341700 ↗
3. IEEE Trans. Instrumentation and Measurements · 1994 · 42 · 322
4. J. Cryst. Growth · 1981 · 52 · 61410.1016/0022-0248(81)90350-x ↗
5. J. Cryst. Growth · 1999 · 198-199 · 87210.1016/s0022-0248(98)01171-3 ↗
6. Phys. Status Solidi C · 2005 · 2 · 157810.1002/pssc.200460838 ↗
7. J. Appl. Phys. · 2013 · 114 · 06370610.1063/1.4817869 ↗
8. J. Cryst. Growth · 2011 · 318 · 106210.1016/j.jcrysgro.2010.11.086 ↗
9. J. Cryst. Growth · 1990 · 101 · 13110.1016/0022-0248(90)90951-g ↗
10. J. Cryst. Growth · 1989 · 94 · 16610.1016/0022-0248(89)90615-5 ↗
11. J. Cryst. Growth · 2012 · 355 · 3310.1016/j.jcrysgro.2012.06.041 ↗
12. J. Alloys and Compounds · 2006 · 423 · 16310.1016/j.jallcom.2005.12.116 ↗
13. J. Electronic Materials · 2009 · 38 · 159310.1007/s11664-009-0780-9 ↗
14. IEEE Trans. Nucl. Sci. · 2013 · 60 · 145010.1109/tns.2013.2243167 ↗
15. IEEE Trans. Nucl. Sci. · 2012 · 59 · 151010.1109/tns.2012.2202917 ↗
16. J. Cryst. Growth · 2017 · 436 · 79
17. J. Cryst. Growth · 2008 · 310 · 206710.1016/j.jcrysgro.2007.11.181 ↗
18. J. Appl. Phys. · 1964 · 35 · 44410.1063/1.1713333 ↗
19. 2011 · 4720
20. J. Cryst. Growth · 2007 · 306 · 3310.1016/j.jcrysgro.2007.03.044 ↗
21. Appl. Phys. Lett. · 2006 · 88 · 24210810.1063/1.2209709 ↗
22. Phys. Of Fluids · 1994 · 6 · 227010.1063/1.868179 ↗
23. J. Cryst. Growth · 1979 · 46 · 47910.1016/0022-0248(79)90033-2 ↗
24. J. Cryst. Growth · 1983 · 63 · 34310.1016/0022-0248(83)90225-7 ↗
25. J. Cryst. Growth · 2011 · 325 · 325
26. APL Materials · 2015 · 3 · 02610210.1063/1.4907250 ↗
27. SPIE Proc. · 2008 · 7079 · 0N-1