journal article·2017-10-01Open access

Electron heating and mode transition in dual frequency atmospheric pressure argon dielectric barrier discharge

Z. L. Zhang, J. W. M. Lim, Q. Y. Nie, X. N. Zhang, B. H. Jiang

AIP Advances· Volume 7· Issue 10

Abstract

Plasma ionization, excitation, mode transitions and associated electron heating mechanisms in atmospheric pressure dielectric barrier discharges (DBD) driven by dual radio frequency sources are investigated in this paper. The electrons are found to be heated mainly by the high frequency component in the plasma bulk when discharged in α mode. On the contrary, the low frequency component is primarily responsible for heating in the sheath which is caused by intense motion in the sheath. It was also found that variation of the lower frequency component ratio could effectively modulate the electron energy distribution as determined from time averaged EEDF. The results above have demonstrated that the independent control of plasma parameters via non-linear synergistic effect between the dual frequency sources can be achieved through reasonable selection of processing parameters.
Source: crossref · Quality: baseline

Research context

OpenAlex topics: Plasma Applications and Diagnostics · Plasma Diagnostics and Applications · Electrohydrodynamics and Fluid Dynamics

SciVX discovery tags are terminology-based. OpenAlex topics are source-provided classifications.

Affiliations

School of Electrical Engineering & Automation, Harbin Institute of Technology 1 , Harbin 150001, P. R. China

Plasma Sources and Applications Center, National Institute of Education, Nanyang Technological University 2 , 1 Nanyang Walks 637616, Singapore

State Key Laboratory of Electrical Insulation and Power Equipment, Xi’an Jiaotong University 3 , Xi’an 710049, China

Laboratory for Space Environment and Physical Sciences, Harbin Institute of Technology 4 , Harbin 150001, P. R. China

Funding

National Natural Science Foundation of China

References (23)

Show source-provided references
1. J. Phys. D: Appl. Phys. · 2005 · 38 · 55510.1088/0022-3727/38/4/007 ↗
2. Plasma Sources Sci. Technol. · 2006 · 15 · S16910.1088/0963-0252/15/4/s03 ↗
3. Plasma Process. Polym. · 2007 · 4 · 26610.1002/ppap.200600114 ↗
4. Appl. Phys. Lett. · 2007 · 90 · 01390310.1063/1.2410219 ↗
5. Appl. Surf. Sci. · 2010 · 256 · 388810.1016/j.apsusc.2010.01.045 ↗
6. Phys. Rev. Lett. · 2007 · 99 · 07500410.1103/physrevlett.99.075004 ↗
7. Appl. Phys. Lett. · 2008 · 93 · 01150310.1063/1.2956411 ↗
8. Appl. Phys. Lett. · 2011 · 99 · 09150110.1063/1.3631758 ↗
9. Appl. Phys. Lett. · 2012 · 100 · 19410110.1063/1.4712128 ↗
10. Appl. Phys. Lett. · 2013 · 102 · 19410210.1063/1.4804583 ↗
11. Appl. Phys. Lett. · 2010 · 96 · 18150110.1063/1.3425668 ↗
12. Appl. Phys. Lett. · 2012 · 101 · 15410710.1063/1.4758463 ↗
13. Phys. Plasma. · 2014 · 21 · 07350710.1063/1.4890481 ↗
14. Phys. Plasmas · 2015 · 22 · 10351510.1063/1.4933352 ↗
15. J. Phys. D: Appl. Phys. · 2016 · 4910.1088/0022-3727/49/49/49lt01 ↗
16. Phys. Plasma. · 2013 · 20 · 05350210.1063/1.4804280 ↗
17. J. Phys. D: Appl. Phys. · 2004 · 37 · 69710.1088/0022-3727/37/5/008 ↗
18. Phys. Plasma. · 2016 · 23 · 07350110.1063/1.4954647 ↗
19. Plasma Sources Sci. Technol. · 2006 · 15 · 20410.1088/0963-0252/15/2/005 ↗
20. Appl. Phys. Lett. · 2008 · 93 · 26150310.1063/1.3058686 ↗
21. IEEE Trans. Plasma Sci. · 2008 · 36 · 95210.1109/tps.2008.922426 ↗
22. 2005
23. Applied phys. Letts · 2008 · 26150310.1063/1.3058686 ↗