Impact of face-to-face annealed sputtered AlN on the optical properties of AlGaN multiple quantum wells

The impact of a face-to-face annealed sputtered AlN/sapphire (FFA Sp-AlN) template with threading-dislocation densities (TDDs) of 2 × 108 cm−2 and an n-type AlGaN (n-AlGaN) underlayer on optical properties of AlGaN multiple quantum wells (MQWs) with an ultraviolet C (UVC) emission is investigated comprehensively. For comparison of the FFA Sp-AlN template with low TDDs, a conventional MOVPE (metalorganic vapor phase epitaxially)-grown AlN/sapphire (MOVPE-AlN) template with TDDs of 1 × 109 cm−2 was prepared. Consequently, cathodoluminescence (CL), temperature-dependent photoluminescence (PL), and time-resolved PL (TR-PL) measurements verified that both the FFA Sp-AlN template and n-AlGaN underlayer are indispensable for obtaining MQWs with high internal quantum efficiencies, which decrease the TDDs and point defect (PD) densities. Our results revealed that 10-period quantum wells (10QWs)/n-AlGaN/AlN grown on the FFA Sp-AlN template exhibit a lower dark spot density in CL panchromatic intensity maps, a higher integrated emission intensity ratio from the temperature-dependent PL (from 15 to 300 K), and a longer nonradiative lifetime from the TR-PL measurements at 300 K compared with those grown on the MOVPE-AlN template. Moreover, we found that the optical properties of 10QWs/AlN in FFA Sp-AlN and MOVPE-AlN templates do not exhibit a significant difference because of the existence of numerous PDs. Our experimental results demonstrate the favorable impact of the FFA Sp-AlN template for low-TDDs and the n-AlGaN underlayer for low-PDs, which holds promise for highly efficient AlGaN deep-ultraviolet light-emitting devices.