The influence of Mg doping on the nucleation of self-induced GaN nanowires
Source abstract
Abstract
GaN nanowires were grown without any catalyst by plasma-assisted molecular beam epitaxy. Under supply of Mg, nanowire nucleation is faster, the areal density of wires increases to a higher value, and nanowire coalescence is more pronounced than without Mg. During nanowire nucleation the Ga desorption was monitored in-situ by line-of-sight quadrupole mass spectrometry for various substrate temperatures. Nucleation energies of 4.0±0.3 eV and 3.2±0.3 eV without and with Mg supply were deduced, respectively. This effect has to be taken into account for the fabrication of nanowire devices and could be employed to tune the NW areal density.
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Research context
OpenAlex topics: GaN-based semiconductor devices and materials · ZnO doping and properties · Nanowire Synthesis and Applications
SciVX discovery tags are terminology-based. OpenAlex topics are source-provided classifications.
Affiliations
Paul-Drude-Institut für Festkörperelektronik 1 , Hausvogteiplatz 5–7, 10117 Berlin, Germany
Institute for Bio & Nanosystems IBN and JARA FIT Julich Aachen Research Alliance 2 Forschungszentrum Julich, , 52425 Julich, Germany
References (42)
Show source-provided references
1. MRS Bulletin · 2007 · 32 · 9910.1557/mrs2007.41 ↗
2. J. J. of Appl. Phys. P.2 · 2004 · 43 · L152410.1143/JJAP.43.L1524 ↗
3. Nano Lett. · 2002 · 2 · 10110.1021/nl015667d ↗
4. Nanotechnology · 2008 · 19 · 27570810.1088/0957-4484/19/27/275708 ↗
5. Nano Lett. · 2008 · 8 · 419110.1021/nl801728d ↗
6. Opt. Express · 2011 · 19 · A31910.1364/OE.19.00A319 ↗
7. Nano Research · 2010 · 3 · 52810.1007/s12274-010-0013-9 ↗
8. IEEE J. Sel. Topics in Quantum Electron. · 2011 · 17 · 87810.1109/JSTQE.2010.2098396 ↗
9. J. J. of Appl. Phys. P.2 · 1997 · 36 · L45910.1143/JJAP.36.L459 ↗
10. J. Cryst. Growth · 1998 · 183 · 2310.1016/S0022-0248(97)00386-2 ↗
11. J. Cryst. Growth · 2006 · 289 · 38110.1016/j.jcrysgro.2005.11.117 ↗
12. J. Cryst. Growth · 2006 · 287 · 52210.1016/j.jcrysgro.2005.11.079 ↗
13. Appl. Phys. Lett. · 2007 · 9110.1063/1.2817941 ↗
14. Nanotechnology · 2011 · 22 · 09560310.1088/0957-4484/22/9/095603 ↗
15. Appl. Phys. Lett. · 2011 · 98 · 10310210.1063/1.3559618 ↗
16. Phys. Rev. B · 2010 · 81 · 04530210.1103/PhysRevB.81.045302 ↗
17. J. Appl. Phys. · 2009 · 106 · 12610210.1063/1.3267151 ↗
18. Phys. Rev. B · 2010 · 8110.1103/PhysRevB.81.085310 ↗
19. Phys. Rev. B · 2011 · 8310.1103/PhysRevB.83.035310 ↗
20. Nano Lett. · 2007 · 7 · 224810.1021/nl0707398 ↗
21. Appl. Phys. Lett. · 2011 · 98 · 07191310.1063/1.3555450 ↗
22. Nano Lett. · 2011 · 11 · 86610.1021/nl104265u ↗
23. Appl. Phys. Lett. · 2010 · 97 · 04310110.1063/1.3464956 ↗
24. Nanotechnology · 2009 · 20 · 41560210.1088/0957-4484/20/41/415602 ↗
25. Appl. Phys. Lett. · 2011 · 99 · 03310210.1063/1.3610964 ↗
26. J. Cryst. Growth · 2011 · 334 · 17710.1016/j.jcrysgro.2011.08.015 ↗
27. Appl. Phys. Lett. · 2006 · 8910.1063/1.2364121 ↗
28. Appl. Phys. Lett. · 2008 · 92
29. Nano Lett. · 2010 · 10 · 342610.1021/nl101465b ↗
30. IEEE J. Sel. Top. Q. Ele. · 2011 · 17 · 85910.1109/JSTQE.2010.2092416 ↗
31. Phys. Rev. Lett. · 2001 · 87 · 1660110.1103/PhysRevLett.87.016601 ↗
32. Appl. Phys. Lett. · 2002 · 80 · 124010.1063/1.1449530 ↗
33. Phys. Rev. B · 2011 · 83 · 24532310.1103/PhysRevB.83.245323 ↗
34. J. Appl. Phys. · 2000 · 88 · 185510.1063/1.1305830 ↗
35. Appl. Phys. Lett. · 2009 · 9510.1063/1.3275793 ↗
36. J. Appl. Phys. · 2008 · 104 · 03430910.1063/1.2953087 ↗
37. J. Optoel. Adv. Mat. · 2010 · 12 · 1433
38. 1978
39. Maissel · 1970
40. Phys. Rev. B · 2009 · 79 · 24130810.1103/PhysRevB.79.241308 ↗
41. Appl. Phys. Exp. · 2008 · 1 · 12400210.1143/APEX.1.124002 ↗
42. Adv. Funct. Mater. · 2010 · 20 · 291110.1002/adfm.201000381 ↗