journal article·2020-09-01Open access

Theoretical assessment of surface waviness on work function

Jacqueline R. Malayter, Allen L. Garner

AIP Advances· Volume 10· Issue 9

Abstract

The work function may affect the physical, electrical, and chemical behavior of surfaces, making it important for numerous applications and phenomena, including field emission, gas breakdown, and nanotechnology. Despite this importance, studies examining the impact of surface roughness on the work function have only examined the amplitude and not the period of the waviness, which becomes increasingly important with reduced device size. This paper extends these previous scanning Kelvin probe (SKP)-based mathematical models for predicting the work function of a metallic surface with surface waviness by explicitly including the period. For a given ratio of surface roughness amplitude to the distance from the SKP to the center of the waviness, increasing the period or reducing the SKP step distance reduced the surface’s effective work function. In the limit of infinite period (or low SKP step size) and low surface roughness amplitude, the work function approached that expected with a concomitant reduction in the gap distance with no surface roughness. The effective surface work function approaches zero and may become negative as the SKP tip approaches the surface, suggesting the importance in these corrections for nanoscale measurements. As the SKP step size approaches the surface roughness period, the effective work function becomes infinitely large. Implications of these results on gas breakdown, field emission, and nanoscale device design will be discussed.
Source: crossref · Quality: baseline

Research context

OpenAlex topics: Vacuum and Plasma Arcs · Metal and Thin Film Mechanics · Plasma Diagnostics and Applications

SciVX discovery tags are terminology-based. OpenAlex topics are source-provided classifications.

Affiliations

School of Electrical and Computer Engineering, Purdue University 1 , West Lafayette, Indiana 47907, USA

School of Nuclear Engineering, Purdue University 2 , West Lafayette, Indiana 47906, USA

Department of Agricultural and Biological Engineering, Purdue University 3 , West Lafayette, Indiana 47907, USA

Funding

Office of Naval Research

References (37)

Show source-provided references
1. 2015
2. J. Chem. Phys. · 2005 · 122 · 06470810.1063/1.1849135 ↗
3. J. Alloys Compd. · 2013 · 577 · 110.1016/j.jallcom.2013.04.113 ↗
4. Discharge behaviors of electrical breakdown across nanometer vacuum gaps
5. Eur. Phys. J. D · 2016 · 70 · 2910.1140/epjd/e2015-60618-1 ↗
6. J. Appl. Phys. · 2019 · 125 · 20330210.1063/1.5085217 ↗
7. J. Phys. D: Appl. Phys. · 2014 · 47 · 50300110.1088/0022-3727/47/50/503001 ↗
8. Plasma Res. Express · 2020 · 2 · 01300110.1088/2516-1067/ab6c84 ↗
9. IEEE Trans. Plasma Sci. · 2020 · 48 · 80810.1109/tps.2020.2979707 ↗
10. Phys. Plasmas · 2018 · 25 · 08211610.1063/1.5046335 ↗
11. Phys. Plasmas · 2019 · 26 · 01450610.1063/1.5081009 ↗
12. Sci. Rep. · 2019 · 9 · 566910.1038/s41598-019-42111-2 ↗
13. Proc. R. Soc. London, Ser. A · 1928 · 119 · 17310.1098/rspa.1928.0091 ↗
14. Phys. Rev. · 1956 · 102 · 146410.1103/physrev.102.1464 ↗
15. Phys. Plasmas · 2012 · 19 · 12351510.1063/1.4773399 ↗
16. Phys. Plasmas · 2017 · 24 · 11352210.1063/1.5004654 ↗
17. Appl. Phys. Lett. · 2016 · 108 · 23410310.1063/1.4953202 ↗
18. IEEE Trans. Plasma Sci. · 2017 · 45 · 57410.1109/tps.2017.2647988 ↗
19. Phys. Plasmas · 2018 · 25 · 10350510.1063/1.5042270 ↗
20. 1984
21. Appl. Surf. Sci. · 2010 · 256 · 260210.1016/j.apsusc.2009.11.002 ↗
22. Rev. Sci. Instrum. · 1983 · 54 · 33710.1063/1.1137369 ↗
23. Nano Res. · 2014 · 7 · 55310.1007/s12274-014-0423-1 ↗
24. Sci. China: Phys., Mech. Astron. · 2017 · 61 · 02732110.1007/s11433-017-9114-8 ↗
25. 1985
26. Rev. Sci. Instrum. · 1988 · 59 · 80210.1063/1.1139779 ↗
27. Int. J. Electrochem. Sci. · 2012 · 7 · 520410.1016/S1452-3981(23)19615-5 ↗
28. ACS Appl. Mater. Interfaces · 2017 · 9 · 2729010.1021/acsami.7b06451 ↗
29. J. Alloys Compd. · 2017 · 692 · 90310.1016/j.jallcom.2016.09.102 ↗
30. J. Appl. Phys. · 2012 · 111 · 12371410.1063/1.4730388 ↗
31. 2015
32. J. Appl. Phys. · 2002 · 91 · 937910.1063/1.1474596 ↗
33. 1999
34. Plasma Chem. Plasma Process. · 2014 · 34 · 5510.1007/s11090-013-9488-y ↗
35. ACS Nano · 2008 · 2 · 62210.1021/nn700190t ↗
36. Electrochim. Acta · 2007 · 53 · 29010.1016/j.electacta.2007.03.016 ↗
37. Appl. Phys. Lett. · 2019 · 114 · 01410310.1063/1.5066236 ↗