journal article·2021-08-01Open access

Fluctuations of the plasma potential in atmospheric pressure micro-plasma jets

Deepika Behmani, Kalyani Barman, Sudeep Bhattacharjee

AIP Advances· Volume 11· Issue 8

Abstract

Fluctuations in plasma floating potential in an atmospheric pressure micro-plasma jet are investigated experimentally. The transport of charged particles toward the ambient air is often seen to be affected by plasma fluctuations. The dependence of fluctuations on operating parameters such as applied voltage, gas flow rate, and gas mixture ratio (He:Ar) is investigated so as to be able to control the fluctuations in the intended application. A single pin probe measures the fluctuations in the jet in a region where the plasma emerges out of the capillary. The fluctuations are characterized by fast Fourier transform and time-frequency analysis (TFA). It is found that with an increase in applied voltage at a fixed flow rate (1 l/min), the fluctuations increase and reach a peak value at ∼11 kV and thereafter decrease at higher voltages due to a high value of discharge current (∼4.77 mA) at 11 kV arising from the intense ionization taking place in the jet. When the gas flow rate is increased at a fixed voltage (14 kV), the fluctuations get enhanced for flow rates beyond 2 l/min due to transition to turbulent flow occurring at a buoyancy induced Reynolds number of ∼474. In the case of gas mixing, an increase in the concentration of Ar and a reduction in He at a fixed applied power (80.6 W) and flow rate (1 l/min) give rise to a higher level of fluctuations, which is considered to be due to lower thermal conductivity and ionization potential of Ar, leading to gas heating, and ponderomotive force, giving rise to filamentation. The TFA shows the time evolution of fluctuation frequencies, which can be tuned by varying the experimental parameters. Understanding the influence of experimental parameters is crucial in controlling the fluctuations in the micro-plasma jet.
Source: crossref · Quality: baseline

Research context

OpenAlex topics: Plasma Applications and Diagnostics · Aerosol Filtration and Electrostatic Precipitation · Plasma Diagnostics and Applications

SciVX discovery tags are terminology-based. OpenAlex topics are source-provided classifications.

Affiliations

Department of Physics, Indian Institute of Technology Kanpur , Kanpur 208016, India

Funding

Board of Research in Nuclear Sciences

References (44)

Show source-provided references
1. Phys. Lett. A · 2014 · 378 · 239510.1016/j.physleta.2014.05.049 ↗
2. J. Coat. Technol. Res. · 2015 · 12 · 22510.1007/s11998-014-9638-z ↗
3. J. Phys. D: Appl. Phys. · 2006 · 39 · 350810.1088/0022-3727/39/16/s08 ↗
4. Jpn. J. Appl. Phys., Part 1 · 2012 · 51 · 01AJ0410.7567/jjap.51.01aj04 ↗
5. J. Colloid Interface Sci. · 2011 · 359 · 31110.1016/j.jcis.2011.03.069 ↗
6. Plasma Processes Polym. · 2009 · 6 · S51910.1002/ppap.200931103 ↗
7. Eur. Phys. J. D · 2010 · 60 · 65310.1140/epjd/e2010-00245-x ↗
8. Thin Solid Films · 2011 · 519 · 707110.1016/j.tsf.2010.11.057 ↗
9. Eur. Phys. J. D · 2018 · 72 · 9810.1140/epjd/e2018-80768-8 ↗
10. J. Phys. D: Appl. Phys. · 2018 · 51 · 08540110.1088/1361-6463/aaa867 ↗
11. J. Appl. Phys. · 2017 · 122 · 02090110.1063/1.4993710 ↗
12. Plasma Processes Polym. · 2010 · 7 · 27410.1002/ppap.200900083 ↗
13. Plasma Sources Sci. Technol. · 2012 · 21 · 03400510.1088/0963-0252/21/3/034005 ↗
14. J. Phys. D: Appl. Phys. · 2012 · 45 · 42200210.1088/0022-3727/45/42/422002 ↗
15. Trends Biotechnol. · 2018 · 36 · 58610.1016/j.tibtech.2017.06.013 ↗
16. Appl. Phys. Rev. · 2021 · 8 · 01130610.1063/5.0022534 ↗
17. Phys. Plasmas · 2020 · 27 · 06351410.1063/5.0008881 ↗
18. J. Phys. D: Appl. Phys. · 2020 · 53 · 12540110.1088/1361-6463/ab62c1 ↗
19. Sci. Rep. · 2018 · 8 · 1541810.1038/s41598-018-33914-w ↗
20. Plasma Sources Sci. Technol. · 2009 · 18 · 04503210.1088/0963-0252/18/4/045032 ↗
21. Plasma Sci. Technol. · 2006 · 8 · 41610.1088/1009-0630/8/4/10 ↗
22. IEEE Trans. Plasma Sci. · 2005 · 33 · 112310.1109/tps.2005.848608 ↗
23. Plasma Chem. Plasma Process. · 2017 · 37 · 54910.1007/s11090-017-9797-7 ↗
24. Appl. Phys. Lett. · 2007 · 91 · 13150110.1063/1.2789397 ↗
25. Plasma Sources Sci. Technol. · 2007 · 16 · 80310.1088/0963-0252/16/4/016 ↗
26. Appl. Surf. Sci. · 2016 · 390 · 48910.1016/j.apsusc.2016.08.047 ↗
27. Plasma Res. Express · 2020 · 2 · 02500710.1088/2516-1067/ab8f39 ↗
28. Phys. Plasmas · 2016 · 23 · 02210910.1063/1.4941595 ↗
29. Thin Solid Films · 2010 · 518 · 345710.1016/j.tsf.2009.11.055 ↗
30. 1987
31. Plasma Sources Sci. Technol. · 2014 · 23 · 02300110.1088/0963-0252/23/2/023001 ↗
32. Nanoscale Res. Lett. · 2014 · 9 · 69710.1186/1556-276x-9-697 ↗
33. Appl. Phys. Lett. · 2009 · 94 · 23150410.1063/1.3153143 ↗
34. Plasma Processes Polym. · 2011 · 8 · 53510.1002/ppap.201000130 ↗
35. J. Phys. D: Appl. Phys. · 2006 · 39 · 347910.1088/0022-3727/39/16/s05 ↗
36. Exp. Fluids · 2005 · 38 · 54110.1007/s00348-005-0927-2 ↗
37. Exp. Fluids · 2005 · 38 · 16110.1007/s00348-004-0878-z ↗
38. 1970 · 232
39. 1991
40. Gaodianya Jishu · 2013 · 39 · 220110.3969/j.issn.1003-6520.2013.09.019 ↗
41. 2009
42. Phys. Plasmas · 2010 · 17 · 05350410.1063/1.3400220 ↗
43. Plasma Sources Sci. Technol. · 2011 · 20 · 05300210.1088/0963-0252/20/5/053002 ↗
44. J. Phys. D: Appl. Phys. · 1974 · 7 · 55110.1088/0022-3727/7/4/309 ↗