Correlation between Pd metal thickness and thermally stable perpendicular magnetic anisotropy features in [Co/Pd]n multilayers at annealing temperatures up to 500 °C
Source abstract
Abstract
We examine highly stable perpendicular magnetic anisotropy (PMA) features of [Co/Pd]10 multilayers (MLs) versus Pd thickness at various ex-situ annealing temperatures. Thermally stable PMA characteristics were observed up to 500 °C, confirming the suitability of these systems for industrial applications at this temperature. Experimental observations suggest that the choice of equivalent Co and Pd layer thicknesses in a ML configuration ensures thermally stable PMA features, even at higher annealing temperatures. X-ray diffraction patterns and cross-sectional transmission electron microscopy images were obtained to determine thickness, post-annealing PMA behavior, and to explore the structural features that govern these findings.
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Research context
OpenAlex topics: Magnetic properties of thin films · Theoretical and Computational Physics · Magnetic and transport properties of perovskites and related materials
SciVX discovery tags are terminology-based. OpenAlex topics are source-provided classifications.
Affiliations
Hanyang University 1 Novel Functional Materials and Devices Lab, The Research Institute for Natural Science, Department of Physics, , Seoul 133-791, South Korea
Hanyang University 2 Division of Nano-Scale Semiconductor Engineering, , Seoul 133-791, South Korea
Hanyang University 3 Nano Quantum Electronics Lab, Department of Electronics and Computer Engineering, , Seoul 133-791, South Korea
Funding
National Research Foundation of Korea
References (16)
Show source-provided references
1. IEEE J. Solid-State Circuits · 2008 · 43 · 10910.1109/JSSC.2007.909751 ↗
2. IEEE J. Solid-State Circuits · 2010 · 45 · 86910.1109/JSSC.2010.2040120 ↗
3. Microelectronics Reliability · 2012 · 52 · 61310.1016/j.microrel.2011.09.028 ↗
4. Appl. Phys. Lett. · 2010 · 97 · 23250810.1063/1.3524230 ↗
5. J. Appl. Phys. · 2004 · 95 · 678910.1063/1.1669212 ↗
6. IEEE Trans. Magn. · 2008 · 44 · 257310.1109/TMAG.2008.2003059 ↗
7. Appl. Phys. Lett. · 2010 · 97 · 20250310.1063/1.3517482 ↗
8. Appl. Phys. Lett. · 2012 · 101 · 03240210.1063/1.4737000 ↗
9. J. Nanosci. Nanotechnol. · 2011 · 11 · 623310.1166/jnn.2011.4475 ↗
10. J. Appl. Phys. · 2013 · 113 · 17C72110.1063/1.4798499 ↗
11. Appl. Phys. Lett. · 2013 · 102 · 05240510.1063/1.4791577 ↗
12. Phys. Rev. Lett. · 1998 · 81 · 522910.1103/PhysRevLett.81.5229 ↗
13. Phys. Rev. B · 1999 · 59 · 110510.1103/PhysRevB.59.1105 ↗
14. J. Appl. Phys. · 2013 · 113 · 21610210.1063/1.4809130 ↗
15. IEEE Trans. Magn. · 2010 · 46 · 205610.1109/TMAG.2009.2038929 ↗
16. IEEE Magn. Lett. · 2013 · 4 · 300010410.1109/LMAG.2013.2270454 ↗