Model evaluations of multipactor suppression in rectangular waveguides through grooved surfaces and static magnetic field
Source abstract
Abstract
Mitigation of multipactor in waveguides is of importance, and strategies have included the addition of external fields, materials engineering, or surface modifications. Here, geometry modifications of rectangular waveguide surfaces and the application of an axial magnetic field are investigated for suppressing multipactor growth. A Monte Carlo approach has been used to simulate electron dynamics. The empirical secondary electrons yield is modeled based on a modified Vaughan approach. The electric fields driving electron transport were derived from separate electromagnetic calculations to adequately include field perturbations due to the presence of surface patterns in the rectangular waveguide structure. Combinations of grooves and a DC magnetic field are shown to effectively mitigate multipactor growth at field strengths up to ∼105 V/m. Finding optimal combinations for an arbitrary field and operating frequency requires further work.
Source: crossref · Quality: baseline
Research context
OpenAlex topics: Particle accelerators and beam dynamics · Particle Accelerators and Free-Electron Lasers · Gyrotron and Vacuum Electronics Research
SciVX discovery tags are terminology-based. OpenAlex topics are source-provided classifications.
Affiliations
Department of Electrical and Computer Engineering, Texas Tech University , Lubbock, Texas 79409, USA
Funding
U.S. Department of Defense
References (62)
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1. IEEE Trans. Electron Devices · 1961 · 8 · 30210.1109/t-ed.1961.14804 ↗
2. IEEE Trans. Electron Devices · 1988 · 35 · 117210.1109/16.3387 ↗
3. IEEE Trans. Plasma Sci. · 2012 · 40 · 28210.1109/tps.2011.2172636 ↗
4. 1986 · 474
5. IEEE Trans. Electr. Insul. · 1993 · 28 · 56610.1109/14.231539 ↗
6. 1993 · 924
7. 1993 · 1178
8. Phys. Plasmas · 1997 · 4 · 94010.1063/1.872564 ↗
9. IEEE Trans. Microwave Theory Tech. · 1994 · 42 · 55810.1109/22.285060 ↗
10. Phys. Rev. Lett. · 1995 · 75 · 121810.1103/physrevlett.75.1218 ↗
11. Phys. Plasmas · 1996 · 3 · 148110.1063/1.872027 ↗
12. Phys. Plasmas · 1998 · 5 · 153510.1063/1.872811 ↗
13. J. Appl. Phys. · 1999 · 86 · 172410.1063/1.370953 ↗
14. Phys. Plasmas · 2007 · 14 · 03350110.1063/1.2480678 ↗
15. Phys. Plasmas · 2007 · 14 · 03350810.1063/1.2710464 ↗
16. J. Appl. Phys. · 2019 · 126 · 12330110.1063/1.5113642 ↗
17. IEEE Trans. Plasma Sci. · 2019 · 47 · 136410.1109/tps.2018.2887048 ↗
18. Phys. Plasmas · 2019 · 26 · 09350410.1063/1.5109682 ↗
19. J. Appl. Phys. · 2009 · 105 · 12330510.1063/1.3153947 ↗
20. Phys. Plasmas · 2015 · 22 · 11350610.1063/1.4935385 ↗
21. J. Appl. Phys. · 2015 · 117 · 05330210.1063/1.4907683 ↗
22. J. Appl. Phys. · 2008 · 104 · 10490410.1063/1.3021149 ↗
23. Suppression of the effective secondary emission yield for a grooved metal surface
24. Nucl. Instrum. Methods Phys. Res., Sect. A · 2003 · 508 · 22710.1016/s0168-9002(03)01660-7 ↗
25. Studies of electron multipacting in CESR type rectangular waveguide couplers
26. J. Appl. Phys. · 2013 · 113 · 07490410.1063/1.4792514 ↗
27. J. Appl. Phys. · 2017 · 122 · 05530410.1063/1.4997465 ↗
28. J. Phys. D: Appl. Phys. · 2013 · 46 · 16510410.1088/0022-3727/46/16/165104 ↗
29. J. Appl. Phys. · 2016 · 120 · 21330210.1063/1.4971337 ↗
30. Appl. Surf. Sci. · 2008 · 255 · 219610.1016/j.apsusc.2008.07.088 ↗
31. ACS Nano · 2011 · 5 · 104710.1021/nn102579f ↗
32. AIP Adv. · 2018 · 8 · 01532510.1063/1.5019360 ↗
33. Phys. Plasmas · 2019 · 26 · 09350310.1063/1.5111734 ↗
34. Phys. Plasmas · 2020 · 27 · 09351110.1063/5.0010389 ↗
35. Phys. Plasmas · 1998 · 5 · 212010.1063/1.872883 ↗
36. Phys. Plasmas · 2018 · 25 · 04350110.1063/1.5024365 ↗
37. Comput. Mater. Sci. · 2016 · 122 · 33110.1016/j.commatsci.2016.05.025 ↗
38. Phys. Plasmas · 2020 · 27 · 08351210.1063/5.0012833 ↗
39. J. Comput. Phys. · 1985 · 60 · 18710.1016/0021-9991(85)90002-6 ↗
40. A short course on fast multipole methods
41. Phys. Rev. Spec. Top.-Accel. Beams · 2000 · 3 · 03200110.1103/physrevstab.3.032001 ↗
42. Appl. Phys. Lett. · 2012 · 101 · 11350610.1063/1.4752457 ↗
43. Phys. Plasmas · 2011 · 18 · 03210510.1063/1.3561821 ↗
44. Phys. Plasmas · 1998 · 5 · 30510.1063/1.872703 ↗
45. IEEE Trans. Plasma Sci. · 1998 · 26 · 29010.1109/27.700756 ↗
46. IEEE Trans. Plasma Sci. · 2000 · 28 · 52910.1109/27.887665 ↗
47. IEEE Trans. Plasma Sci. · 2009 · 37 · 196810.1109/TPS.2009.2016967 ↗
48. IEEE Trans. Electron Devices · 1989 · 36 · 196310.1109/16.34278 ↗
49. J. Vac. Sci. Technol. B · 2020 · 38 · 01380110.1116/1.5130683 ↗
50. IEEE Trans. Electron Devices · 1993 · 40 · 196310.1109/16.202798 ↗
51. IEEE Trans. Electron Devices · 1993 · 40 · 82410.1109/16.202797 ↗
52. Phys. Rev. Lett. · 2004 · 93 · 01480110.1103/physrevlett.93.014801 ↗
53. Phys. Rev. Spec. Top.-Accel. Beams · 2002 · 5 · 12440410.1103/physrevstab.5.124404 ↗
54. 1990
55. 1991
56. Opt. Lett. · 2014 · 39 · 299010.1364/ol.39.002990 ↗
57. Appl. Sci. · 2020 · 10 · 160010.3390/app10051600 ↗
58. J. Phys. D: Appl. Phys. · 2015 · 48 · 38520310.1088/0022-3727/48/38/385203 ↗
59. AIP Adv. · 2020 · 10 · 04501110.1063/1.5143108 ↗
60. IEEE Electron Device Lett. · 2012 · 33 · 72710.1109/led.2012.2186952 ↗
61. The secondary electron yield of technical materials and its variation with surface treatments
62. J. Vac. Sci. Technol. A · 2000 · 18 · 97210.1116/1.582286 ↗