Influence of distance between sample surface and focal point on spectral intensity of nanosecond laser-induced silicon plasma in air

The influence of distance between sample surface and focal point on optical emission spectroscopy of laser-induced silicon plasma by a nanosecond Nd:YAG laser operating at the wavelength of 1064 nm was investigated in air. Our results show that the emission intensity of Si (I) 390.6 nm line and N (II) 399.5 nm line depends strongly on the distance between sample surface and focal point. When the surface of ablated sample is away from the focal point of focusing lens, the neutral atomic line (Si(I) signal to be measured) is much higher than the ionic line (interference signal N (II)). Therefore, we can improve the intensity of Si (I) signal to be measured, and reduce the intensity of interference signal N (II). The presented result is mainly based on the reduction of interaction between the plasma plume and the ambient air, leading to much weaker collisions.