journal article·2020-02-01Open access

Investigation of resistive switching and transport mechanisms of Al2O3/TiO2−x memristors under cryogenic conditions (1.5 K)

Yann Beilliard, François Paquette, Frédéric Brousseau, Serge Ecoffey, Fabien Alibart, Dominique Drouin

AIP Advances· Volume 10· Issue 2

Abstract

Resistive switching and transport mechanisms of Al2O3/TiO2−x memristor crosspoint devices have been investigated at cryogenic temperatures down to 1.5 K, for the future development of memristor-based cryogenic electronics. We report successful resistive switching of our devices in the temperature range of 300–1.5 K. The current–voltage curves exhibit negative differential resistance effects between 130 K and 1.5 K, attributed to a metal–insulator transition of the Ti4O7 conductive filament. The resulting highly nonlinear behavior is associated with an ION/IOFF diode ratio of 84 at 1.5 K, paving the way for selector-free cryogenic passive crossbars. Temperature-dependent thermal activation energies related to the conductance at low bias (20 mV) are extracted for memristors in a low resistance state, suggesting hopping-type conduction mechanisms. Finally, the transport mechanism analysis at 1.5 K indicates that for all resistance states, the conduction follows the space-charge limited current model in low fields, whereas trap-assisted tunneling dominates in higher fields.
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Research context

OpenAlex topics: Advanced Memory and Neural Computing · Ferroelectric and Negative Capacitance Devices · Transition Metal Oxide Nanomaterials

SciVX discovery tags are terminology-based. OpenAlex topics are source-provided classifications.

Affiliations

Institut Interdisciplinaire d’Innovation Technologique (3IT), Université de Sherbrooke 1 , Sherbrooke, Québec J1K 0A5, Canada

Laboratoire Nanotechnologies Nanosystèmes (LN2) – CNRS UMI-3463 – 3IT 2 , Sherbrooke, Québec J1K 0A5, Canada

Institut Quantique (IQ), Université de Sherbrooke 3 , Sherbrooke, Québec J1K 2R1, Canada

Institute of Electronics, Microelectronics and Nanotechnology (IEMN), Université de Lille 4 , 59650 Villeneuve d’Ascq, France

Funding

Natural Sciences and Engineering Research Council of Canada · H2020 Excellent Science

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