Influence of substrate on structural, morphological and optical properties of TiO2 thin films deposited by reaction magnetron sputtering
Source abstract
Abstract
Titanium dioxide (TiO2) films have been prepared by DC reaction magnetron sputtering technique on different substrates (glass, SiO2, platinum electrode-Pt, Silicon-Si). X-ray diffraction (XRD) patterns showed that all TiO2 films were grown along the preferred orientation of (110) plane. Samples on Si and Pt substrates are almost monophasic rutile, however, samples on glass and SiO2 substrates accompanied by a weak anatase structure. Atomic force microscopy (AFM) images revealed uniform grain distribution except for films on Pt substrates. Photoluminescence (PL) spectra showed obvious intrinsic emission band, but films on glass was accompanied by a distinct defect luminescence region. Raman spectroscopy suggested that all samples moved to high wavenumbers and films on glass moved obviously.
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Research context
OpenAlex topics: TiO2 Photocatalysis and Solar Cells · Gas Sensing Nanomaterials and Sensors · Advanced Photocatalysis Techniques
SciVX discovery tags are terminology-based. OpenAlex topics are source-provided classifications.
Affiliations
College of Optoelectronic Technology, Chengdu University of Information Technology 1 , Chengdu 610225, P. R. China
College of Intelligent Manufacturing, Sichuan University of Arts and Science 2 , Dazhou 635002, P. R. China
Funding
National Natural Science Foundation of China · Department of Science and Technology of Sichuan Province
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