Surface smoothing effect of an amorphous thin film deposited by atomic layer deposition on a surface with nano-sized roughness
Source abstract
Abstract
Previously, Lau (one of the authors) pointed out that the deposition of an amorphous thin film by atomic layer deposition (ALD) on a substrate with nano-sized roughness probably has a surface smoothing effect. In this letter, polycrystalline zinc oxide deposited by ALD onto a smooth substrate was used as a substrate with nano-sized roughness. Atomic force microscopy (AFM) and cross-sectional transmission electron microscopy (XTEM) were used to demonstrate that an amorphous aluminum oxide thin film deposited by ALD can reduce the surface roughness of a polycrystalline zinc oxide coated substrate.
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Research context
OpenAlex topics: Semiconductor materials and devices · Thin-Film Transistor Technologies · ZnO doping and properties
SciVX discovery tags are terminology-based. OpenAlex topics are source-provided classifications.
Affiliations
Zhejiang University 1 , Department of Information Science and Electronic Engineering, No. 38 Zheda Road, Hangzhou 310027, People's Republic of China
Zhejiang University 2 , Department of Materials Science and Engineering, No. 38 Zheda Road, Hangzhou 310027, People's Republic of China
Bolton University 3 Institute of Renewable Energy & Environment Technology, , Deane Road, Bolton BL3 5 AB, United Kingdom
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