High dislocation density of tin induced by electric current
Source abstract
Abstract
A dislocation density of as high as 1017 /m2 in a tin strip, as revealed by high resolution transmission electron microscope, was induced by current stressing at 6.5 x 103 A/ cm2. The dislocations exist in terms of dislocation line, dislocation loop, and dislocation aggregates. Electron Backscattered Diffraction images reflect that the high dislocation density induced the formation of low deflection angle subgrains, high deflection angle Widmanstätten grains, and recrystallization. The recrystallization gave rise to grain refining.
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Research context
OpenAlex topics: Microstructure and mechanical properties · Electromagnetic Effects on Materials · Metal and Thin Film Mechanics
SciVX discovery tags are terminology-based. OpenAlex topics are source-provided classifications.
Affiliations
National Cheng Kung University 1 Department of Material Science and Engineering, , Tainan 70101, Taiwan, R. O. C
National Central University 2 Department of Chemical and Material Engineering, , Jhongli 32001, Taiwan, R. O. C
Funding
Ministry of Science and Technology, Taiwan
References (18)
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