Fabrication of various micro/nano structures by modified near-field electrospinning

The modified near-field electrospinning (NFES) and the conventional NFES have been compared to demonstrate the viability of direct-writing micro/nano structures from PVDF solution systems. The modified NFES shows good capability in writing various orderly micro/nano patterns, such as straight and continuous lines, parallel lines, arc lines, and beads-on-string structures, whereas the conventional NFES is difficult to give a continuous writing process. Besides, the modified NFES also allows a lower electric field due to the jet initiated in a mechanical way. By finely tuning the key parameters during the modified NFES process, such as the solution property, speed of the movable collector, and the distance between the spinneret and the collector, it is likely to construct complex patterns as required on rigid or flexible substrates for a myriad of applications.