Effect of grain-boundaries on electrical properties of n-ZnO:Al/p-Si heterojunction diodes
Source abstract
Abstract
We report on room temperature diode characteristics of ZnO:Al (AZO)/Si heterostructures by current-voltage measurements. In this study, with increasing AZO film thickness, systematic reduction in the turn-on potential (from 3.16 to 1.80 V) and the film stress are observed. Complementary capacitance-voltage studies reveal a decreasing trend in barrier height at the junction with increasing AZO film thickness. A gradual decrease in resistivity takes place with increasing AZO film thickness. Above observations are explained in the framework of AZO thickness dependent variation in grain size and in turn trap density at the grain boundaries influencing carrier transport across the adjacent grains.
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Research context
OpenAlex topics: ZnO doping and properties · Semiconductor materials and interfaces · Semiconductor materials and devices
SciVX discovery tags are terminology-based. OpenAlex topics are source-provided classifications.
Affiliations
Institute of Physics 1 , Sachivalaya Marg, Bhubaneswar 751 005, Odisha, India
Shiv Nadar University 2 Department of Physics, , Gautam Budh Nagar, Near Greater Noida 203 207, Uttar Pradesh, India
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