Analysis of thermoelectric properties of amorphous InGaZnO thin film by controlling carrier concentration
Source abstract
Abstract
We have investigated the thermoelectric properties of amorphous InGaZnO (a-IGZO) thin films optimized by adjusting the carrier concentration. The a-IGZO films were produced under various oxygen flow ratios. The Seebeck coefficient and the electrical conductivity were measured from 100 to 400 K. We found that the power factor (PF) at 300 K had a maximum value of 82 × 10−6 W/mK2, where the carrier density was 7.7 × 1019 cm−3. Moreover, the obtained data was analyzed by fitting the percolation model. Theoretical analysis revealed that the Fermi level was located approximately above the potential barrier when the PF became maximal. The thermoelectric properties were controlled by the relationship between the position of Fermi level and the height of potential energy barriers.
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Research context
OpenAlex topics: Advanced Thermoelectric Materials and Devices · Thin-Film Transistor Technologies · Transition Metal Oxide Nanomaterials
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Affiliations
Nara Institute of Science and Technology Graduate School of Materials Science, 8916-5 Takayama, Ikoma, Nara 630-0192, Japan
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