Recent progress on high power impulse magnetron sputtering (HiPIMS): The challenges and applications in fabricating VO2 thin film
Source abstract
Abstract
High power impulse magnetron sputtering (HiPIMS) is well known in modern physical vapor deposition (PVD) owing to its high peak power density, high degree of ionization, high plasma density and hence high ion flux towards the substrate that allows ones to deposit high quality thin films in comparison with conventional magnetron sputtering technology. The present short review on HiPIMS intends to provide readers with a summary of the current status of this emerging PVD technique: the developmental history, the plasma characterization, and the applications in hardness and functional thin film fabrications. Several items on the distinctive feature of HiPIMS, including self-sputtering mechanism, low deposition rate, arcing phenomenon and key factors of deposition process are reviewed in detail. To limit the scope, the emphasis is put on thermo-chromic VO2 thin film deposited by HiPIMS. Based on this typical issue, some classical ideas and approaches on fabrication of the functional thin films through HiPIMS technique are demonstrated.
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Research context
OpenAlex topics: ZnO doping and properties · Metal and Thin Film Mechanics · Ga2O3 and related materials
SciVX discovery tags are terminology-based. OpenAlex topics are source-provided classifications.
Affiliations
Laboratory of Plasma Physics and Materials, Beijing Institute of Graphic Communication 1 , Beijing 102600, People’s Republic of China
Department of Materials Engineering, Ming Chi University of Technology 2 , Taipei 24301, Taiwan
Center for Plasma and Thin Film Technologies, Ming Chi University of Technology 3 , Taipei 24301, Taiwan
Funding
National Natural Science Foundation of China · Organization department of Beijing Municipal Party Committee · Beijing Municipal Commission of Education · Beijing Institute of Graphic Communication
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