Next generation nanolithography based on Ru/Be and Rh/Sr multilayer optics
Source abstract
Abstract
A prospective move to 10.5 and 11.2 nm wavelengths, as an alternative to 6.7 and 13.5 nm, for next generation nanolithography is discussed. Ten-mirror optical systems based on Ru/Be, Mo/Be, Rh/Sr, Mo/Si, and La/B multilayers were compared for efficiency at their working wavelengths. It is shown that a transition to 10.5 nm and 11.2 nm may be a solution to the problem of increasing performance and resolution of a projection system.
Source: crossref · Quality: baseline
Research context
OpenAlex topics: Advanced Surface Polishing Techniques · Optical Coatings and Gratings · Nanofabrication and Lithography Techniques
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Affiliations
Institute for Physics of Microstructures of RAS , GSP-105, 603950, Nizhny Novgorod, Russia
References (26)
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