Nanolithography: Selectable Nanopattern Arrays for Nanolithographic Imprint and Etch‐Mask Applications (Adv. Sci. 7/2015)
Source abstract
Abstract
A parallel nanolithographic patterning method is presented by P. Fischer and co-workers in article number 1500016 that can be used to obtain arrays of multifunctional nanoparticles. These patterns can simply be converted into a variety of secondary nanopatterns that are useful for nanolithographic imprint, plasmonic, and etch-mask applications. Image by Alejandro Posada Boada.
Source: openalex_inverted_index · Quality: baseline
Research context
OpenAlex topics: Nanofabrication and Lithography Techniques · Advancements in Photolithography Techniques · Nanomaterials and Printing Technologies
SciVX discovery tags are terminology-based. OpenAlex topics are source-provided classifications.
Affiliations
Max Planck Institute for Intelligent Systems Heisenbergstr. 3 70569 Stuttgart Germany
Institute for Materials Discovery University College London Kathleen Lonsdale Building Gower Place London WC1E 6BT UK
Department of Biophysical Chemistry University of Heidelberg INF 253 69120 Heidelberg Germany
Institute for Physical Chemistry University of Stuttgart Pfaffenwaldring 55 70569 Stuttgart Germany
References
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