journal article·2025-02Open access

Wet Photolithography From Hydrogen Abstraction of a Quasi‐Orthogonal Aggregation‐Induced Emitter

Chen Cao, Huan Chen, Jia‐Ming Jin, Ji‐Hua Tan, Hong‐Ji Tan, Jiu‐Dong Lin, Wen‐Cheng Chen, Yi Yuan, Ze‐Lin Zhu, Chun‐Sing Lee

Advanced Science· Volume 12· Issue 8

Abstract

Abstract A new aggregation‐induced emission (AIE) luminogen is obtained by dimerizing acridin‐9(10H)‐one (Ac), an aggregation‐caused quenching (ACQ) effect monomer via an N─N bond and forming 9H,9′H‐[10,10′‐biacridine]‐9,9′‐dione (DiAc) with D2d symmetry. The quenching of DiAc in solution is ascribed to the enhanced basicity promoting hydrogen bonding and then a hydrogen abstraction (HA) reaction and/or an unallowed transition in frontier orbitals with the same symmetry facilitating intersystem crossing. It is found that emissive Ac is one product of the non‐emissive DiAc solution in the HA reaction activated by UV irradiation. By exploiting the AIE properties and the HA reaction of DiAc, photolithographic patterning is demonstrated with a paper wetted with DiAc solution.
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Research context

OpenAlex topics: Luminescence and Fluorescent Materials · Advanced biosensing and bioanalysis techniques · Organic Light-Emitting Diodes Research

SciVX discovery tags are terminology-based. OpenAlex topics are source-provided classifications.

Affiliations

Center of Super‐Diamond and Advanced Films (COSDAF) and Department of Chemistry City University of Hong Kong Hong Kong SAR 999077 P. R. China

School of Chemical Engineering and Light Industry Guangdong University of Technology Guangzhou 510006 P. R. China

WISPO Advanced Materials (Suzhou) Co. Ltd. No. Building 12, 200 Xingpu Rd, SIP Suzhou 215000 P. R. China

School of Chemistry and Chemical Engineering University of South China Hengyang 421001 P. R. China

Funding

Natural Science Foundation of Hunan Province · University Grants Committee

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