Tape‐Assisted Residual Layer‐Free One‐Step Nanoimprinting of High‐Index Hybrid Polymer for Optical Loss‐Suppressed Metasurfaces (Adv. Sci. 10/2025)

Tape-Assisted Nanoimprint Lithography In article number 2409371, Junsuk Rho, Yujin Park, and co-workers introduce a novel fabrication technique that utilizes tape to exfoliate the high-index residual layer in particle-embedded resinbased nanoimprint lithography. This method enables the replication of high-index nanostructures without residual layers, demonstrating the potential for the commercialization of high-performance metasurfaces. Notably, they achieve vivid structural color metasurfaces through nanoimprinting, a breakthrough that was previously unattainable using conventional techniques.