Ultrafast Laser Manipulation of In‐Lattice Plasmonic Nanoparticles (Adv. Sci. 38/2024)

In-Lattice Plasmonic Nanolithography The scalable production of hybrid plasmonic materials on single-crystalline substrates to achieve outstanding optical properties is a challenging task. In article number 2402840, Saulius Juodkazis, Feng Chen and colleagues introduce an advanced in-lattice plasmonic nanolithography process for functional crystals, successfully fabricating nanorods that demonstrate robust polarization selectivity directly within the lattice. This innovative approach has the potential to customize on-chip and in-chip integrated micro-nano photonic structures and devices with exceptional properties in functional materials and single-crystal films.