Boosting the Performance of Epitaxial Perovskite Microstructures by Surface Passivation
Source abstract
Abstract
Abstract Epitaxial growth enables the fabrication of films and heterostructures with exceptional properties, particularly when performed on single‐crystalline substrates with a suitable lattice type and lattice parameters. While epitaxial growth is extensively utilized for conventional semiconductors, epitaxial micro‐ and nanostructures of lead‐halide perovskites have also been successfully obtained through vapor‐phase and liquid‐phase deposition techniques. Surface passivation, widely employed in polycrystalline perovskite films and single crystals to suppress surface recombination of charge carriers, is often overlooked for epitaxial structures due to the presumption that their inherently smooth surfaces are free of defects. In this study, surface passivation agents commonly used in colloidal nanocrystal chemistry are investigated, such as trioctylphosphine oxide (TOPO), or protective matrices like poly (methyl methacrylate) (PMMA), to improve the performance of epitaxially grown Formamidinium lead bromide (FAPbBr 3 ) and Cesium lead bromide (CsPbBr 3 ) micro‐ and nanostructures. These findings reveal that surface passivation significantly boosts luminescence intensity and decay times, reduces lasing thresholds to record‐low levels for microcrystalline perovskite lasers, and enhances the specific detectivity of photoconductors. These advancements are consistent across structures grown by both vapor deposition and solution processing. This study highlights the critical role of surface passivation for achieving the full potential of epitaxially grown perovskite structures, thereby paving the way for advanced optoelectronic applications.
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Research context
OpenAlex topics: Perovskite Materials and Applications · Electronic and Structural Properties of Oxides · Optical Coatings and Gratings
SciVX discovery tags are terminology-based. OpenAlex topics are source-provided classifications.
Affiliations
Institute of Materials for Electronics and Energy Technology (i‐MEET) Department of Materials Science and Engineering Friedrich‐Alexander‐Universität Erlangen‐Nürnberg Martensstrasse 7 91058 Erlangen Germany
Institute‐Materials for Electronics and Energy Technology (i‐MEET) Department of Materials Science and Engineering Friedrich‐Alexander‐Universität Erlangen‐Nürnberg Energy Campus Nürnberg Fürtherstraße 250 90429 Nürnberg Germany
Department of Materials Engineering School of Engineering University of Tokyo Bunkyo Tokyo 113‐8656 Japan
Research Center for Advanced Science and Technology University of Tokyo Meguro Tokyo 153‐8904 Japan
Faculty of Mathematics and Physics Department of Surface and Plasma Science Charles University V Holešovičkách 2 Prague 180 00 Czech Republic
Institute of Physics Polish Academy of Sciences Aleja Lotnikow 32/46 Warsaw 02–668 Poland
International Research Centre MagTop Institute of Physics Polish Academy of Sciences Aleja Lotnikow 32/46 Warsaw 02–668 Poland
Zernike Institute for Advanced Materials University of Groningen Nijenborgh 3 Groningen 9747AG The Netherlands
Helmholtz‐Institute Erlangen‐Nürnberg (HI ERN) Immerwahrstraße 2 91058 Erlangen Germany
Institute of Applied Mechanics Friedrich‐Alexander‐Universität Erlangen‐Nürnberg Egerlandstrasse 5 91058 Erlangen Germany
Funding
Fundacja na rzecz Nauki Polskiej · China Scholarship Council · Deutsche Forschungsgemeinschaft · European Commission
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