journal article·2025-02Open access

Ultrasensitive Photodetection and Metal‐Semiconductor Transition in Bi2S3 Phototransistor

Yujue Yang, Zhidong Pan, Xueting Liu, Huafeng Dong, Xin Zhang, Fugen Wu, Nengjie Huo

Advanced Optical Materials· Volume 13· Issue 5

Abstract

Abstract Bismuth sulfide (Bi2S3) single crystal shows a great advantage of the direct band gap, high photo‐absorption, and non‐toxic elements. The ideal prerequisites for ultrasensitive photodetector is low noise and high gain, which are however not simultaneously present in existing Bi2S3 photodetectors. Herein, a three‐terminal phototransistor based on Bi2S3 flakes, achieving both low noise and high photo‐gain for ultrasensitive photodetection capability is developed. By applying negative gate voltage, the Bi2S3 channel is depleted, leading to a low noise spectral density of 3.3 × 10−12 A Hz−1/2. Leveraging the photo‐gating effect, a high photo‐gain of ≈108 is also yielded. These two factors have led to a high responsivity of 3 × 108 A/W and high detectivity up to 1.6 × 1015 Jones at 635 nm, which have surpassed that in commercial and newly emerging photodetectors. Through the temperature‐dependent electrical transport and photo‐response measurement, the phototransistor demonstrates an interesting metal‐semiconductor transition due to the strong electron‐electron interactions by applying positive gate voltage for high levels of electron doping. A suppressed hysteresis and persistent photoconductivity are observed at low temperatures, suggestive of the existence of trap states. This work develops the Bi2S3 photo‐transistor with ultrasensitive photodetection and metal‐semiconductor transition, providing a promising system for strong correlation effects and photodetector applications.
Source: crossref · Quality: baseline

Research context

OpenAlex topics: 2D Materials and Applications · Chalcogenide Semiconductor Thin Films · Advanced Thermoelectric Materials and Devices

SciVX discovery tags are terminology-based. OpenAlex topics are source-provided classifications.

Affiliations

School of Physics and Optoelectronic Engineering Guangdong University of Technology Guangzhou 510006 P. R. China

Guangdong Provincial Key Laboratory of Chip and Integration Technology School of Electronic Science and Engineering South China Normal University Foshan 528225 P. R. China

Funding

Basic and Applied Basic Research Foundation of Guangdong Province

References (29)

Show source-provided references
1. 10.1038/nphoton.2015.10810.1038/nphoton.2015.108 ↗
2. 10.1038/s41467-020-16370-x10.1038/s41467-020-16370-x ↗
3. 10.1016/S1350-4495(02)00140-810.1016/S1350-4495(02)00140-8 ↗
4. 10.1002/adma.20180116410.1002/adma.201801164 ↗
5. 10.1021/acs.nanolett.3c0239610.1021/acs.nanolett.3c02396 ↗
6. 10.1021/acsnano.1c1018110.1021/acsnano.1c10181 ↗
7. 10.1002/adfm.20180687810.1002/adfm.201806878 ↗
8. 10.1002/adfm.20170597010.1002/adfm.201705970 ↗
9. 10.1002/adma.20200441210.1002/adma.202004412 ↗
10. 10.1021/acsphotonics.6b0039110.1021/acsphotonics.6b00391 ↗
11. 10.1016/j.nanoen.2015.03.03610.1016/j.nanoen.2015.03.036 ↗
12. 10.1039/C6CE01879C10.1039/C6CE01879C ↗
13. 10.1038/nphoton.2012.13910.1038/nphoton.2012.139 ↗
14. 10.1002/anie.20070503410.1002/anie.200705034 ↗
15. 10.1021/nl802600z10.1021/nl802600z ↗
16. 10.1016/j.materresbull.2017.10.02610.1016/j.materresbull.2017.10.026 ↗
17. 10.1039/C7NR09046C10.1039/C7NR09046C ↗
18. 10.1002/smll.20140350810.1002/smll.201403508 ↗
19. 10.1002/adom.20190025810.1002/adom.201900258 ↗
20. 10.1021/acs.chemmater.6b0347810.1021/acs.chemmater.6b03478 ↗
21. 10.1088/1361-6528/aa79ce10.1088/1361-6528/aa79ce ↗
22. 10.1002/cphc.20140259410.1002/cphc.201402594 ↗
23. 10.1002/adfm.20130387910.1002/adfm.201303879 ↗
24. 10.1038/nnano.2013.10010.1038/nnano.2013.100 ↗
25. 10.1038/nmat368710.1038/nmat3687 ↗
26. 10.1038/s41699-017-0038-y10.1038/s41699-017-0038-y ↗
27. 10.1063/1.494240610.1063/1.4942406 ↗
28. 10.1021/acs.nanolett.6b0290510.1021/acs.nanolett.6b02905 ↗
29. 10.1103/PhysRevB.85.11531710.1103/PhysRevB.85.115317 ↗