journal article·2024-06

Enhanced Performance in Cesium Tellurium Chlorine by Hafnium Alloying for X‐Ray Computed Tomography Imaging

Jun'an Lai, Pengjiu Wang, Baofeng Zheng, Tongtong Xuan, Daofu Wu, Zixian Wang, Yijia Wang, Wenxia Zhang, Juan Du, Peng He, Kang An, Xiaosheng Tang

Advanced Optical Materials· Volume 12· Issue 17
Publisher page

Abstract

Abstract The term “light yield” (LY) refers to the ability of scintillator materials to convert high‐energy radiation into visible light. A higher LY corresponds to improved energy and spatial resolution in detectors. The enhancement of scintillator material performance is a crucial aspect of their development. In this study, the Cs2TeCl6 (CTC) double perovskite microcrystals is synthesized, and the broadband yellow emission shows a high degree of matching with the Charge‐coupled Device (CCD). However, the LY of CTC is poor for practical applications in X‐ray imaging. The scintillation performance is significantly enhanced through hafnium alloying. The LY increased from ≈4167 to 38 523 photons/MeV, and the detection limit decreased from 948 to 258 nGy s−1. The underlying mechanism of Te4+ ions emission is systematically explored through density function theory (DFT) analysis, along with investigations into pressure‐dependent photoluminescence, temperature‐dependent photoluminescence, and low‐temperature thermoluminescence. Furthermore, a flexible X‐ray scintillator screen with an outstanding high spatial resolution of 15.9 lp mm−1 is successfully fabricated. This work not only represents a substantial advancement in the scintillation performance of Te4+ ions emission double perovskite microcrystals but also provides an effective strategy for the development of the next generation of halide scintillators.
Source: crossref · Quality: baseline

Research context

OpenAlex topics: Atomic and Subatomic Physics Research · Advanced Semiconductor Detectors and Materials · Advanced X-ray and CT Imaging

SciVX discovery tags are terminology-based. OpenAlex topics are source-provided classifications.

Affiliations

Key Laboratory of Optoelectronic Technology & Systems (Ministry of Education) College of Optoelectronic Engineering Chongqing University Chongqing 400044 P. R. China

Qinghai Institute of Salt Lakes Chinese academy of sciences No.18 Xinning Avenue Xining Qinghai 810008 P. R. China

College of Chemical Engineering Shenyang University of Chemical Technology Shenyang 110142 P. R. China

Fujian Key Laboratory of Surface and Interface Engineering for High Performance Materials College of Materials Xiamen University Xiamen 361005 P. R. China

State Key Laboratory of Catalysis Dalian Institute of Chemical Physics Chinese Academy of Sciences Dalian 116023 P. R. China

College of Optoelectronic Engineering Chongqing University of Posts and Telecommunications Chongqing 400065 P. R. China

State Key Laboratory of High Field Laser Physics and CAS Center for Excellence in Ultra‐Intense Laser Science Shanghai Institute of Optics and Fine Mechanics Chinese Academy of Sciences Shanghai 201800 P. R. China

School of Physics and Optoelectronic Engineering Hangzhou Institute for Advanced Study University of Chinese Academy of Sciences Hangzhou 310024 P. R. China

School of Materials Science and Engineering Zhengzhou University Zhengzhou 450001 P. R. China

Funding

National Natural Science Foundation of China · State Key Laboratory of High Field Laser Physics · China Postdoctoral Science Foundation · Natural Science Foundation of Chongqing Municipality

References (66)

Show source-provided references
1. 10.1021/acsenergylett.0c0243010.1021/acsenergylett.0c02430 ↗
2. 10.1016/j.matt.2020.11.01510.1016/j.matt.2020.11.015 ↗
3. 10.1016/j.mattod.2022.04.00910.1016/j.mattod.2022.04.009 ↗
4. Zhou F. · Small Methods · 2020 · 4 · 1
5. 10.1088/0957-0233/17/4/R0110.1088/0957-0233/17/4/R01 ↗
6. 10.1002/chem.20210044910.1002/chem.202100449 ↗
7. 10.1007/s00330-023-09545-910.1007/s00330-023-09545-9 ↗
8. 10.1038/s41467-019-08981-w10.1038/s41467-019-08981-w ↗
9. 10.1007/978-3-319-45522-810.1007/978-3-319-45522-8 ↗
10. Hong Z. · Front. Chem. · 2022 · 10 · 1
11. 10.1002/anie.20230463810.1002/anie.202304638 ↗
12. 10.1002/adma.20220480110.1002/adma.202204801 ↗
13. Zhang F. · Laser Photonics Rev. · 2023 · 2200848 · 1
14. 10.1038/s41586-018-0451-110.1038/s41586-018-0451-1 ↗
15. 10.1002/advs.20200019510.1002/advs.202000195 ↗
16. 10.1038/s41467-020-20314-w10.1038/s41467-020-20314-w ↗
17. Qu K. · Adv. Opt. Mater. · 2023 · 2202883 · 1
18. 10.1002/pssb.20030429610.1002/pssb.200304296 ↗
19. 10.1021/acsami.1c0425210.1021/acsami.1c04252 ↗
20. Jiang J. · Adv. Opt. Mater. · 2023 · 11 · 1
21. 10.1002/adma.20190699510.1002/adma.201906995 ↗
22. 10.1016/j.jechem.2021.06.03310.1016/j.jechem.2021.06.033 ↗
23. 10.1002/adma.20221108810.1002/adma.202211088 ↗
24. 10.1002/smtd.20190042610.1002/smtd.201900426 ↗
25. Liu S. · Laser Photonics Rev. · 2022 · 16 · 1
26. 10.1002/ange.20211608510.1002/ange.202116085 ↗
27. 10.1039/D0TC05752E10.1039/D0TC05752E ↗
28. Liu Y. · Adv. Opt. Mater. · 2021 · 9 · 1
29. 10.1002/adom.20210080410.1002/adom.202100804 ↗
30. 10.1007/s12274-020-3214-x10.1007/s12274-020-3214-x ↗
31. 10.1016/j.cej.2021.12974010.1016/j.cej.2021.129740 ↗
32. 10.1021/acs.inorgchem.1c0247310.1021/acs.inorgchem.1c02473 ↗
33. 10.1021/acs.inorgchem.2c0027210.1021/acs.inorgchem.2c00272 ↗
34. 10.1039/D2TC05153B10.1039/D2TC05153B ↗
35. 10.1039/C8RA01084F10.1039/C8RA01084F ↗
36. 10.1016/j.cej.2019.12231410.1016/j.cej.2019.122314 ↗
37. Guo Z. · Adv. Mater. · 2021 · 33 · 1
38. Yao P. P. · Acta Phys. Sin. · 2020 · 69 · 21
39. 10.1021/jacs.9b1341910.1021/jacs.9b13419 ↗
40. 10.1021/acs.inorgchem.1c0403210.1021/acs.inorgchem.1c04032 ↗
41. Zhao D. · Adv. Mater. · 2021 · 33 · 1
42. 10.1002/adfm.20210463010.1002/adfm.202104630 ↗
43. 10.1021/jacs.1c0620710.1021/jacs.1c06207 ↗
44. 10.1016/0022-4596(86)90233-110.1016/0022-4596(86)90233-1 ↗
45. 10.1016/0375-9601(68)90486-610.1016/0375-9601(68)90486-6 ↗
46. 10.1002/adma.20180653810.1002/adma.201806538 ↗
47. 10.1021/acsami.7b1727110.1021/acsami.7b17271 ↗
48. 10.1021/acs.chemmater.8b0012910.1021/acs.chemmater.8b00129 ↗
49. 10.1016/0022-2313(94)90315-810.1016/0022-2313(94)90315-8 ↗
50. 10.1016/j.nima.2006.05.08510.1016/j.nima.2006.05.085 ↗
51. 10.1109/TED.2020.299876310.1109/TED.2020.2998763 ↗
52. 10.1016/j.materresbull.2018.04.05010.1016/j.materresbull.2018.04.050 ↗
53. ISO 19232‐5:2013(E).Non‐destructive testing — Image quality of radiographs — Part 5: Determination of the image unsharpness value using duplex wire‐type image quality indicators.
54. 10.1109/23.60380310.1109/23.603803 ↗
55. 10.1016/j.radphyschem.2019.10836510.1016/j.radphyschem.2019.108365 ↗
56. 10.1016/j.nima.2008.04.07910.1016/j.nima.2008.04.079 ↗
57. 10.1021/acsnano.8b0948410.1021/acsnano.8b09484 ↗
58. 10.1038/srep3725410.1038/srep37254 ↗
59. Cheng S. · Phys. Status Solidi – Rapid Res. Lett. · 2020 · 14 · 2
60. 10.1002/advs.20200019510.1002/advs.202000195 ↗
61. Jiang T. · Adv. Funct. Mater. · 2021 · 31 · 1
62. Xu H. · Adv. Mater. · 2023 · 2300136 · 1
63. Li B. · Adv. Opt. Mater. · 2022 · 10 · 1
64. 10.1039/D3CC00730H10.1039/D3CC00730H ↗
65. 10.1103/PhysRevB.54.1116910.1103/PhysRevB.54.11169 ↗
66. 10.1038/s41563-021-01132-x10.1038/s41563-021-01132-x ↗