journal article·2022-12

Enhanced Light–Tellurium Interaction through Evanescent Wave Coupling for High Speed Mid‐Infrared Photodetection

Hui Ma, Jianghong Wu, Yunpeng Wang, Chuyu Zhong, Yuting Ye, Maoliang Wei, Rui Yu, Yiqing Du, Bo Tang, Cheng Sun, Yilin Shi, Chunlei Sun, Lichun Wang, Haiming Zhu, Xvsheng Qiao, Lan Li, Hongtao Lin

Advanced Optical Materials· Volume 10· Issue 23
Publisher page

Abstract

Abstract Mid‐infrared (MIR) waveguide‐integrated photodetector is essential for various applications in the fields of sensing and optical communications. However, it is challenging to integrate traditional MIR photoactive materials such as HgCdTe or III−V compounds with complementary metal‐oxide‐semiconductor (CMOS)‐compatible silicon platform due to the lattice mismatch. Tellurium (Te), a novel van der Waals (vdW) material with a narrow bandgap, high carrier mobility, and great air stability, is a promising candidate for high‐performance MIR detection. Here, high‐quality Te nanosheets are synthesized using a hydrothermal method and their carrier dynamics are characterized by transient reflection spectrum. The effect of mobility anisotropy on response speed is investigated intuitively by a free space phototransistor. Combining the strong evanescent wave of a waveguide architecture with the synergy effect between the carrier collection path and the highest mobility crystal orientation in Te, an integrated Te photodetector with enhanced light–matter interaction and reduced carrier transit time is achieved. For the first time, the MIR waveguide‐integrated Te photodetector with a responsivity of 2.3 A W−1 and a bandwidth of 4 GHz at 2015 nm is realized, which is the highest speed MIR photodetector based on narrow bandgap vdW materials to date.
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Research context

OpenAlex topics: Photonic and Optical Devices · Advanced Fiber Laser Technologies · 2D Materials and Applications

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Affiliations

State Key Laboratory of Modern Optical Instrumentation College of Information Science and Electronic Engineering Zhejiang University Hangzhou 310027 China

MOE Frontier Science Center for Brain Science & Brain‐Machine Integration Zhejiang University Hangzhou 310027 China

Key Laboratory of 3D Micro/Nano Fabrication and Characterization of Zhejiang Province School of Engineering Westlake University Hangzhou 310024 China

Institute of Advanced Technology Westlake Institute for Advanced Study 18 Shilongshan Road Hangzhou 310024 China

State Key Laboratory of Silicon Materials & School of Materials Science and Engineering Zhejiang University Hangzhou 310027 China

Institute of Microelectronics Chinese Academic Society Beijing 100029 China

Key Laboratory of Excited‐State Materials of Zhejiang Province Department of Chemistry Zhejiang University Hangzhou Zhejiang 310027 China

Funding

National Natural Science Foundation of China · National Key Research and Development Program of China · Fundamental Research Funds for the Central Universities

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