Recent Patterning Methods for Halide Perovskite Nanoparticles

Abstract Halide perovskites emerge as attractive materials because of their superior optical and optoelectrical properties. Patterned perovskites are useful because they can maximize the optical and electronic properties of perovskites to thereby enhance optoelectronic devices. However, halide perovskite patterning devices are limited by their instability (caused by lattice strain) and ionic properties (e.g., halide migration). Moreover, it is very difficult to pattern perovskites using common photolithography methods. Researchers have tried to overcome these obstacles by searching for templates or avoiding photoresists or direct patterning techniques. In this article, research into perovskite patterning methods that do not use conventional photolithography is reviewed, and a roadmap for direct optical perovskite patterning research is suggested.