journal article·2016-04Open access

Photolithography: An Efficient and Low‐Cost Photolithographic‐Pattern‐Transfer Technique to Fabricate Electrode Arrays for Micro‐/Nanoelectronics (Adv. Mater. Technol. 1/2016)

Yongtao Li, Le Huang, Mianzeng Zhong, Zhongming Wei, Jingbo Li

Advanced Materials Technologies· Volume 1· Issue 1

Abstract

Zhongming Wei, Jingbo Li and co-workers propose, in article 1600001, a novel and low-cost technique for fabricating electrode arrays of micro-/nanoelectronics via photolithographic pattern transfer. This practical and universal method could be widely and reliably used for making different electrode arrays of (opto)electronics based on 2D materials or other semiconductors for the fabrication of complex devices including top-gate field-effect transistors, Hall bars, and heterostructured diodes.
Source: openalex_inverted_index · Quality: baseline

Research context

OpenAlex topics: Nanofabrication and Lithography Techniques · Additive Manufacturing and 3D Printing Technologies · Nanomaterials and Printing Technologies

SciVX discovery tags are terminology-based. OpenAlex topics are source-provided classifications.

Affiliations

State Key Laboratory of Superlattices and Microstructures Institute of Semiconductors Chinese Academy of Sciences Beijing 100083 P. R. China

References

Reference metadata was not supplied for this record.