Photolithography: An Efficient and Low‐Cost Photolithographic‐Pattern‐Transfer Technique to Fabricate Electrode Arrays for Micro‐/Nanoelectronics (Adv. Mater. Technol. 1/2016)
Source abstract
Abstract
Zhongming Wei, Jingbo Li and co-workers propose, in article 1600001, a novel and low-cost technique for fabricating electrode arrays of micro-/nanoelectronics via photolithographic pattern transfer. This practical and universal method could be widely and reliably used for making different electrode arrays of (opto)electronics based on 2D materials or other semiconductors for the fabrication of complex devices including top-gate field-effect transistors, Hall bars, and heterostructured diodes.
Source: openalex_inverted_index · Quality: baseline
Research context
OpenAlex topics: Nanofabrication and Lithography Techniques · Additive Manufacturing and 3D Printing Technologies · Nanomaterials and Printing Technologies
SciVX discovery tags are terminology-based. OpenAlex topics are source-provided classifications.
Affiliations
State Key Laboratory of Superlattices and Microstructures Institute of Semiconductors Chinese Academy of Sciences Beijing 100083 P. R. China
References
Reference metadata was not supplied for this record.