Line‐Shaped Laser Lithography for Efficiently Fabricating Flexible Transparent Electrodes with Hierarchical Metal Grids across λ/10 to Microscale

Abstract Hierarchical metal grids are proven to be a promising solution for achieving high‐performance flexible transparent electrodes (FTEs) due to their significantly enhanced conductivity without noticeably sacrificing transparency. This work develops a one‐step mask‐free line‐shaped laser lithography by separated pulse laser ablation to efficiently fabricate large‐area FTEs composed of hierarchical metal grids, namely microscale grids interconnected with aligned nanowire arrays. The linewidth of aligned wires is highly controllable from the nanometer scale far beyond the diffraction limit (<λ/10) to the micrometer scale. This work experimentally studies the overall performance of FTEs to provide a guideline for selecting the layout and feature sizes of hierarchical metal grids. Hierarchical metal grids with 50 nm nanowires aligned inside the microscale grids show outstanding optoelectronic properties and mechanical stability, with sheet resistance of 4.6 Ω sq⁻¹, transmittance of 82.9%, and a tiny increase in sheet resistance less than 4% after 1000 cycles of bending tests. These results prove that the line‐shaped laser lithography technique is a facile, low‐cost, and high‐throughput fabrication method for high‐performance FTEs.