Patterning Technologies for Metal Halide Perovskites: A Review

Abstract Metal halide perovskite (MHP) materials have become a research hotspot in recent years due to their unique optical and electrical properties. In the process of preparing MHP materials into optoelectronic devices, patterning is often a key step. The ability to achieve high‐precision and high‐quality patterned films determines whether the corresponding high‐quality applications can be made. At present, there are a lot of patterning researches. Based on the classification of operation methods, this review divides the current MHP patterning methods into three categories: template patterning, inkjet printing patterning, and laser patterning, which describes the operation means, research status, pattern accuracy, method advantages, and future development prospect of each method in detail. This review provides a detailed reference for the research and application of MHP materials, and provides a method basis for future development.