DataVXAdvanced Materials InterfacesPaper
journal article·2018-08Open access

Atomic Layer Deposition: Circular Double‐Patterning Lithography Using a Block Copolymer Template and Atomic Layer Deposition (Adv. Mater. Interfaces 16/2018)

Zhixin Wan, Ha Jin Lee, Hyun Gu Kim, Gyeong Cheon Jo, Woon Ik Park, Seung Wook Ryu, Han‐Bo‐Ram Lee, Se‐Hun Kwon

Advanced Materials Interfaces· Volume 5· Issue 16
Publisher pageOpen full text
Source abstract

Abstract

An approach that combines a bottom-up self-assembly process and a top-down semiconductor fabrication process is suggested for nanoscale fabrication. Well-aligned nanotube and nanorod junction structures are successfully fabricated through the circular double patterning method using diblock copolymer and atomic layer deposition, and applied to controls of reflectivity and wettability. This is reported by Zhixin Wan, Han-Bo-Ram Lee, Se-Hun Kwon and co-workers in article number 1800054.
Source: openalex_inverted_index · Quality: baseline

Research context

NanomaterialsElectronic materialsMaterials processing

OpenAlex topics: Block Copolymer Self-Assembly

SciVX discovery tags are terminology-based. OpenAlex topics are source-provided classifications.

Affiliations

School of Materials Science and Engineering Global Frontier R&D Center for Hybrid Interface Materials Institute of Materials Technology Pusan National University Busan 46241 South Korea

Department of Materials Science and Engineering Innovation Center for Chemical Engineering Incheon National University Incheon 22012 South Korea

Department of Chemistry Korea Advanced Institute of Science and Technology (KAIST) Daejeon 305701 South Korea

Electronic Convergence Materials Division Korea Institute of Ceramic Engineering and Technology (KICET) 101 Soho‐ro, Jinju 52851 Republic of Korea

SK Hynix 2091 Gyeongchung‐Daero Bubal‐rub Icheon‐si Gyeonggi‐do Incheon 17336 South Korea

References

Reference metadata was not supplied for this record.