Nickel Oxide: Electron‐Blocking and Oxygen Evolution Catalyst Layers by Plasma‐Enhanced Atomic Layer Deposition of Nickel Oxide (Adv. Mater. Interfaces 16/2018)
Source abstract
Abstract
In article number 1701531, Alexander G. Hufnagel, Thomas Bein and co-workers present the development and applications of a plasma-enhanced atomic layer deposition process for nickel oxide. This method produces high-purity, ultrathin conformal films using nickelocene as an inexpensive precursor. The films can be used as hole-selective contacts in photovoltaic cells and as efficient oxygen evolution catalysts for water electrolysis.
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Research context
OpenAlex topics: Semiconductor materials and devices
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Affiliations
Department of Chemistry and Center for NanoScience (CeNS) Ludwig‐Maximilians‐Universität München (LMU) Butenandtstr. 5–13 (E) 81377 Munich Germany
Forschungszentrum Jülich GmbH Institute of Energy and Climate Research (IEK‐1) Materials Synthesis and Processing Wilhelm‐Johnen‐Straße 52425 Juelich Germany
Faculty of Engineering and Center for Nanointegration Duisburg‐Essen (CENIDE) University of Duisburg‐Essen Lotharstraße 1 47057 Duisburg Germany
References
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