Optoelectronic Devices: Wafer‐Scale Highly Ordered Anodic Aluminum Oxide by Soft Nanoimprinting Lithography for Optoelectronics Light Management (Adv. Mater. Interfaces 5/2017)
Source abstract
Abstract
D. Li, P. Chang and co-workers present the largearea highly ordered porous anodic aluminum oxide (HOAAO) membranes based on full-field nanoimprinting lithography using soft stamps and electrochemical anodization in article number 1601116. The porous films with straight nanochannels and inverted nanocones are rationally obtained via finely tuned electrochemical anodization. In addition, the large area HOAAO films with tunable nanostructures can provide a versatile platform for high-performance optoelectronic devices.
Source: openalex_inverted_index · Quality: baseline
Research context
OpenAlex topics: Anodic Oxide Films and Nanostructures · Nanofabrication and Lithography Techniques
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Affiliations
Key Laboratory of Soft Chemistry and Functional Materials of Education Ministry Nanjing University of Science and Technology Nanjing 210094 China
Shanghai Advanced Research Institute Chinese Academy of Sciences 99 Haike Road, Zhangjiang Hi‐Tech Park Pudong Shanghai 201210 China
Laboratory of Materials Integration Kainan University No. 1, Kainan Road Taoyuan City 338 Taiwan
References
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