Fabrication of High‐Performance Devices on Water‐Soluble Lead Halide Perovskites Using Water‐Based Photolithography

Abstract The alluring optoelectronic properties of lead halide perovskites have continued to attract enormous interest from the scientific community. They are among the brightest candidates for future optoelectronic devices. However, making active devices out of single nano/microcrystals of lead halide perovskites has been a major hurdle and this has dulled its position as a future optoelectric material considerably. The notoriety of not withstanding the steps in photolithography is at the core of this problem. Here, a noninvasive sacrificial layer‐assisted photolithography technique is reported to successfully make active nano/microdevices on single nano/microcrystals of water‐soluble lead halide perovskite. The sacrificial layer can easily be removed without altering the photoresist patterns which makes it possible to fabricate complex high‐performance devices on water‐soluble samples. It is believed that this technique can easily integrate with existing technologies and can elevate the research and application in the field of lead halide perovskites and other water‐soluble materials to new heights.