journal article·2021-08Open access

Electronic Doping and Enhancement of n‐Channel Polycrystalline OFET Performance through Gate Oxide Modifications with Aminosilanes

Nara Shin, Karl Sebastian Schellhammer, Min Ho Lee, Jakob Zessin, Mike Hambsch, Alberto Salleo, Frank Ortmann, Stefan C. B. Mannsfeld

Advanced Materials Interfaces· Volume 8· Issue 16

Abstract

Abstract Self‐assembled monolayers (SAMs) are widely employed in organic field‐effect transistors to modify the surface energy, surface roughness, film growth kinetics, and electrical surface potential of the gate oxide to control the device's operating voltage. In this study, amino‐functionalized SAM molecules are compared to pure alkylsilane SAMS in terms of their impact on the electrical properties of organic field‐effect transistors, using the n‐type polycrystalline small molecule semiconductor material N,N′‐dioctyl‐3,4,9,10‐perylenedicarboximide (PTCDI‐C8). In order to understand the electronic impact of the amino groups, the effect of both the number of amino‐containing functional groups and the SAM molecular length are systematically studied. Though amino‐functionalized SAM materials have been studied previously, this study is, for the first time, able to shed light on the nature of the doping effect that occurs when the gate oxide is treated with polar aminosilane materials. By a comprehensive theoretical study of the interface on the molecular level, it is shown that the observed shift in the threshold voltage is caused by free charges, which are attracted to the PTCDI‐C8 and are stabilized there by protonated aminosilanes. This attraction and the voltage shift can be systematically tuned by varying the length of the neutral terminal chain of the aminosilane.
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Research context

OpenAlex topics: Semiconductor materials and devices · Molecular Junctions and Nanostructures · Organic Electronics and Photovoltaics

SciVX discovery tags are terminology-based. OpenAlex topics are source-provided classifications.

Affiliations

Center for Advancing Electronics (cfaed) Technische Universität Dresden 01062 Dresden Germany

Faculty of Electrical and Computer Engineering Technische Universität Dresden 01062 Dresden Germany

Leibniz‐Institute for Solid State and Materials Research Dresden (IFW Dresden) Helmholtzstr. 20 01069 Dresden Germany

Department of Materials Science and Engineering Stanford University 496 Lomita Mall Stanford CA 94305 USA

Department of Chemistry Technische Universität München Lichtenbergstr. 4 85748 Garching b. München Germany

Funding

Deutsche Forschungsgemeinschaft

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