journal article·2016-09

Self‐Assembled Monolayer Dielectrics for Low‐Voltage Carbon Nanotube Transistors with Controlled Network Density

Stefan P. Schießl, Florentina Gannott, Sebastian H. Etschel, Manuel Schweiger, Saeideh Grünler, Marcus Halik, Jana Zaumseil

Advanced Materials Interfaces· Volume 3· Issue 18
Publisher page

Abstract

Control of the density and uniformity of semiconducting single‐walled carbon nanotube (SWNT) networks is crucial for their application in field‐effect transistors (FETs) and critically depends on the surface of the substrate. Here, the concept of self‐assembled monolayer (SAM) dielectrics on aluminum/aluminum oxide bottom‐gate electrodes is used to create low‐voltage (<2 V) FETs with SWNT networks. The influence of different phosphonic acid SAMs is investigated on the final network density and charge transport properties of solution‐deposited, polyfluorene‐sorted large‐diameter semiconducting SWNT. Positively charged, imidazolium‐terminated SAMs and those with high dipole moments result in the highest network densities for both spin‐coating and dip‐coating. However, FETs with moderate SWNT coverage on SAMs with long alkyl chains and amine or hydroxyl end‐groups yield the best combination of high on‐conductances and high hole mobilities (up to 20 cm2 V−1 s−1) with low trap densities and short critical channel lengths (<2 μm). These parameters are suitable for future short channel, flexible, and high‐frequency FETs.
Source: crossref · Quality: baseline

Research context

OpenAlex topics: Carbon Nanotubes in Composites · Graphene research and applications · Mechanical and Optical Resonators

SciVX discovery tags are terminology-based. OpenAlex topics are source-provided classifications.

Affiliations

Institute for Physical Chemistry Universität Heidelberg Im Neuenheimer Feld 253 69120 Heidelberg Germany

Department of Materials Science and Engineering Friedrich‐Alexander‐Universität Erlangen‐Nürnberg Martensstr. 7 91058 Erlangen Germany

Funding

Deutsche Forschungsgemeinschaft

References (43)

Show source-provided references
1. 10.1088/0268-1242/30/7/07400110.1088/0268-1242/30/7/074001 ↗
2. 10.1038/nnano.2011.110.1038/nnano.2011.1 ↗
3. 10.1021/nl401934a10.1021/nl401934a ↗
4. 10.1002/smll.20120315410.1002/smll.201203154 ↗
5. 10.1021/nl202695v10.1021/nl202695v ↗
6. 10.1038/nnano.2006.5210.1038/nnano.2006.52 ↗
7. 10.1038/ncomms131310.1038/ncomms1313 ↗
8. 10.1002/adma.20130487310.1002/adma.201304873 ↗
9. 10.1038/nnano.2007.29010.1038/nnano.2007.290 ↗
10. 10.1002/adma.20130026710.1002/adma.201300267 ↗
11. 10.1021/am506971b10.1021/am506971b ↗
12. 10.1002/adma.20150495810.1002/adma.201504958 ↗
13. 10.1021/ja506315j10.1021/ja506315j ↗
14. 10.1021/nn203870c10.1021/nn203870c ↗
15. 10.1126/science.115658810.1126/science.1156588 ↗
16. 10.1038/nnano.2012.18910.1038/nnano.2012.189 ↗
17. 10.1016/j.orgel.2015.07.00610.1016/j.orgel.2015.07.006 ↗
18. 10.1021/am502168x10.1021/am502168x ↗
19. 10.1038/nature0553310.1038/nature05533 ↗
20. 10.1016/j.orgel.2014.02.02810.1016/j.orgel.2014.02.028 ↗
21. 10.1021/ja307802q10.1021/ja307802q ↗
22. 10.1002/admi.20140023810.1002/admi.201400238 ↗
23. 10.1021/nl061534m10.1021/nl061534m ↗
24. 10.1021/nl802982m10.1021/nl802982m ↗
25. 10.1002/smll.20100225410.1002/smll.201002254 ↗
26. 10.1002/smll.20110167710.1002/smll.201101677 ↗
27. 10.1021/ja303807u10.1021/ja303807u ↗
28. 10.1021/acsami.5b0274710.1021/acsami.5b02747 ↗
29. 10.1021/nn405488n10.1021/nn405488n ↗
30. 10.1039/C4NR02527J10.1039/C4NR02527J ↗
31. 10.1021/nl203701g10.1021/nl203701g ↗
32. 10.1021/nn305277d10.1021/nn305277d ↗
33. 10.1021/nl303877310.1021/nl3038773 ↗
34. 10.1021/nn502436310.1021/nn5024363 ↗
35. 10.1063/1.492946110.1063/1.4929461 ↗
36. 10.1002/adma.20090055010.1002/adma.200900550 ↗
37. 10.1063/1.243146510.1063/1.2431465 ↗
38. 10.1002/adma.20110420610.1002/adma.201104206 ↗
39. Sze S. M. · 1981
40. 10.1021/acs.accounts.5b0002210.1021/acs.accounts.5b00022 ↗
41. 10.1021/am501332610.1021/am5013326 ↗
42. 10.1063/1.493722310.1063/1.4937223 ↗
43. 10.1021/acsnano.5b0557210.1021/acsnano.5b05572 ↗