Reversible/Irreversible Photobleaching of Fluorescent Surface Defects of SiC Quantum Dots: Mechanism and Sensing of Solar UV Irradiation
Source abstract
Abstract
Abstract Knowledge about photobleaching properties of the fluorescent surface defects of the semiconductor quantum dots (QDs) is crucial for their applications. Here, the photobleaching properties of the fluorescent surface defects of the colloidal 3C‐SiC QDs are reported. The combined experimental and theoretical study reveals that the observed violet fluorescence at around 392 nm stems from the carboxylic acid group‐related surface defects. When the SiC QDs are exposed to the UV irradiation, the 392 nm fluorescent surface defects show both reversible and irreversible photobleaching, whereas the 438 nm fluorescent surface defects show only irreversible photobleaching. The photochemical mechanisms dominating these phenomena are explored. The photobleaching property of the SiC QDs is utilized to detect the solar UV irradiation with high accuracy. The photobleaching of the SiC QDs is highly sensitive to the hydrogen or metal ion concentration in the colloid solution. These findings deepen the understanding of the properties of the fluorescent surface defects of the SiC QDs and pave the way for their applications in sensing.
Source: crossref · Quality: baseline
Research context
OpenAlex topics: Carbon and Quantum Dots Applications · ZnO doping and properties · Ga2O3 and related materials
SciVX discovery tags are terminology-based. OpenAlex topics are source-provided classifications.
Affiliations
College of Engineering Nanjing Agricultural University Nanjing 210031 P. R. China
Department of Applied Physics Nanjing University of Science and Technology Nanjing 210094 P. R. China
School of Physics Southeast University Nanjing 211189 P. R. China
Funding
National Natural Science Foundation of China · Natural Science Foundation of Jiangsu Province
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